公开(公告)号：NL2004808A

公开(公告)日：2011-01-12

申请号：NL2004808

申请日：2010-06-03

Applicant: ASML NETHERLANDS BV

Inventor： PATEL HRISHIKESH ,  STEFFENS KOEN ,  LEMPENS HAN ,  LIEROP MATHIEUS ,  METSENAERE CHRISTOPHE ,  SPRUYTENBURG PATRICK ,  VERSTRAETE JORIS ,  BLOKS RUUD ,  MIRANDA MARCIO ,  JACOBS JOHANNES ,  LIEBREGTS PAULUS ,  HAM RONALD ,  SIMONS WILHELMUS ,  DIRECKS DANIEL ,  JANSSEN FRANCISCUS ,  BERKVENS PAUL ,  BRANDS GERT-JAN

IPC: G03F7/20

Abstract: A fluid handling structure configured to supply and confine immersion liquid to a space defined between a projection system and a facing surface facing the fluid handling structure is disclosed. The fluid handling structure includes a supply passage formed therein for the passage of fluid from outside the fluid handling structure to the space, and a thermal isolator positioned adjacent the supply passage at least partly to isolate fluid in the supply passage from a thermal load induced in the fluid handling structure.

公开(公告)号：NL2004305A

公开(公告)日：2010-09-14

申请号：NL2004305

申请日：2010-02-26

Applicant: ASML NETHERLANDS BV

Inventor： STAVENGA MARCO ,  SHULEPOV SERGEI ,  STEFFENS KOEN ,  LIEROP MATHIEUS ,  DAVID SAMUEL ,  BESSEMS DAVID

IPC: G03F7/20 ,  G03F9/00

Abstract: A substrate table for an immersion lithographic apparatus is disclosed having a recess, configured to receive a substrate of a given size, and a fluid extraction system, configured to extract fluid from a gap between the edge of the substrate and the edge of the recess, the fluid extraction system configured such that the rate of flow of fluid extracted from a localized section of the gap is greater than the rate of flow of fluid extracted from another section of the gap.