公开(公告)号：NL2004305A

公开(公告)日：2010-09-14

申请号：NL2004305

申请日：2010-02-26

Applicant: ASML NETHERLANDS BV

Inventor： STAVENGA MARCO ,  SHULEPOV SERGEI ,  STEFFENS KOEN ,  LIEROP MATHIEUS ,  DAVID SAMUEL ,  BESSEMS DAVID

IPC: G03F7/20 ,  G03F9/00

Abstract: A substrate table for an immersion lithographic apparatus is disclosed having a recess, configured to receive a substrate of a given size, and a fluid extraction system, configured to extract fluid from a gap between the edge of the substrate and the edge of the recess, the fluid extraction system configured such that the rate of flow of fluid extracted from a localized section of the gap is greater than the rate of flow of fluid extracted from another section of the gap.

公开(公告)号：NL2005717A

公开(公告)日：2011-06-21

申请号：NL2005717

申请日：2010-11-18

Applicant: ASML NETHERLANDS BV

Inventor： GOSEN JEROEN ,  JANSEN ALBERT ,  KATE NICOLAAS ,  STAVENGA MARCO ,  STEFFENS KOEN ,  BOKHOVEN LAURENTIUS ,  CASTELIJNS HENRICUS ,  CUYPERS KOEN

IPC: G03F7/20

公开(公告)号：NL2003914A

公开(公告)日：2010-06-09

申请号：NL2003914

申请日：2009-12-07

Applicant: ASML NETHERLANDS BV

Inventor： KNAAPEN THIJS ,  PELLENS RUDY ,  HOEVEN JAN ,  ANSTOTZ DAVID ,  BRANDS GERT-JAN ,  BADAM VIJAY ,  ZANDEN MARCUS ,  GROOT CASPER ,  BRULS RICHARD ,  DOMMELEN YOURI ,  JACOBS JOHANNES ,  KAMPHUIS MARTIJN ,  LIEBREGTS PAULUS ,  MAAS RUDOLF ,  STAVENGA MARCO ,  VERSPAGET COEN

IPC: G03F7/20

Abstract: A lithographic apparatus having a table including a target and/or a sensor and a liquid displacing device to displace liquid from the target and/or sensor using a localized gas flow is disclosed. The liquid displacement device may be positioned at various positions, e.g. mounted to a liquid handling device at an exposure station, adjacent or in a transfer path between the exposure station and a measurement station, at a load/unload station or adjacent a sensor.