公开(公告)号：SG156572A1

公开(公告)日：2009-11-26

申请号：SG2009023359

申请日：2009-04-03

Applicant: ASML NETHERLANDS BV

Inventor： BUTLER HANS ,  CUIJPERS MARTINUS AGNES WILLEM ,  HOOGENDAM CHRISTIAAN ALEXANDER ,  DE JONGH ROBERTUS JOHANNES MARINUS ,  RENKENS MICHAEL JOZEF MATHIJS ,  VAN DER WIJST MARC WILHELMUS MARIA ,  WIJCKMANS MAURICE WILLEM JOZEF ETIENNE ,  TOUSAIN ROBERTUS LEONARDUS ,  FAASSEN RONALD PETRUS HENDRICUS ,  KOEVOETS ADRIANUS HENDRIK

Abstract: A positioning system to position a table within a base frame of a lithographic apparatus, the positioning system including: a first actuator to exert an actuation force on the table, the first actuator being connected to a first balance mass constructed and arranged to absorb a reaction force of the first actuator, wherein the positioning system includes a controller and a second actuator constructed and arranged to exert a compensation force and/or torque to compensate a torque caused by the actuation force exerted by the first actuator on the first balance mass.