公开(公告)号：JP2013079939A

公开(公告)日：2013-05-02

申请号：JP2012167132

申请日：2012-07-27

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： KOENEN WILLEM HERMAN GERTRUDA ANNA ,  EUSSEN EMIEL JOZEF MELANIE ,  VAN DER PASCH ENGELBERTUS ANTONIUS FRANSISCUS ,  ROBBERT EDGAR VAN LEEUWEN ,  KOEVOETS ADRIANUS HENDRIK

IPC: G01B21/00 ,  G01B11/00 ,  G03F7/20 ,  H01L21/027 ,  H01L21/68

CPC classification number: H01L23/544 ,  G03F7/70 ,  G03F7/70775 ,  G03F9/7019 ,  H01L21/682 ,  H01L2223/5442 ,  H01L2223/54426 ,  H01L2223/54453 ,  H01L2223/5446 ,  H01L2924/0002 ,  H01L2924/00

Abstract: PROBLEM TO BE SOLVED: To provide a more accurate position measurement system using a calibration which takes less time than a conventional calibration method.SOLUTION: A position measurement system includes a first part EG, a second part ES and a computational unit. The first part and the second part determine a position of a first member relative to a second member by providing a position signal representing a position of the first part relative to the second part. The computational unit comprises an input terminal for receiving the position signal. The computational unit is configured to, in use, apply a conversion to the position signal to obtain a signal representing a position of the first member relative to the second member, and apply an adjustment to the conversion to at least partly compensate for a drift of the first part or the second part or both. The adjustment is based on a predetermined drift characteristic of the first part or the second part or both respectively. The predetermined drift characteristic includes one or more base shapes of the first part and/or the second part.

Abstract translation: 要解决的问题：提供使用比常规校准方法花费更少时间的校准的更精确的位置测量系统。 解决方案：位置测量系统包括第一部分EG，第二部分ES和计算单元。 第一部分和第二部分通过提供表示第一部分相对于第二部分的位置的位置信号来确定第一部件相对于第二部件的位置。 计算单元包括用于接收位置信号的输入端。 计算单元被配置为在使用中将转换应用于位置信号以获得表示第一构件相对于第二构件的位置的信号，并且对转换应用调整以至少部分地补偿 第一部分或第二部分或两者。 该调整基于第一部分或第二部分或两者的预定漂移特性。 预定漂移特性包括第一部分和/或第二部分的一个或多个基本形状。 版权所有（C）2013，JPO＆INPIT

公开(公告)号：JP2010141321A

公开(公告)日：2010-06-24

申请号：JP2009276028

申请日：2009-12-04

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： LOOPSTRA ERIK ROELOF ,  WIJCKMANS MAURICE WILLEM JOZEF ETIENNE ,  TOUSAIN ROBERTUS LEONARDUS ,  KOEVOETS ADRIANUS HENDRIK

IPC: H01L21/027

CPC classification number: G03F7/709 ,  G03F7/70525 ,  G03F7/70758 ,  G03F7/70766

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus which decreases disturbance of a projection system due to the scanning power of a movable object.
SOLUTION: The lithographic apparatus includes: an illumination system configured to condition a radiation beam; a patterning device support constructed to support a patterning device capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table WT constructed to hold a substrate; a projection system PS configured to project the patterned radiation beam onto a target portion of the substrate; an active air mount AM supporting the projection system PS and including at least one actuator; and a feed-forward device FD configured to provide a feed-forward signal to the at least one actuator on the basis of a set-point signal of a movable object, wherein the feed-forward signal is designed to decrease a disturbance effect on the projection system PS due to movement of the movable object.
COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供一种降低由于可移动物体的扫描力引起的投影系统干扰的光刻设备。 解决方案：光刻设备包括：被配置为调节辐射束的照明系统; 图案形成装置支撑件，其被构造成支撑能够在其横截面中赋予辐射束图案以形成图案化辐射束的图案形成装置; 构造成保持衬底的衬底台WT; 投影系统PS被配置为将图案化的辐射束投影到基板的目标部分上; 支撑投影系统PS并且包括至少一个致动器的主动气垫AM; 以及前馈装置FD，其被配置为基于可移动对象的设定点信号向所述至少一个致动器提供前馈信号，其中所述前馈信号被设计为减小对所述可移动物体的干扰效应 投影系统PS由于可移动物体的移动。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2011037261A

公开(公告)日：2011-02-24

申请号：JP2010147035

申请日：2010-06-29

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： KRUIJT-STEGEMAN YVONNE WENDELA ,  JEUNINK ANDRE BERNARDUS ,  DEN BOEF ARIE JEFFREY ,  BANINE VADIM YEVGENYEVICH ,  RENKENS MICHAEL JOZEF MATHIJS ,  GERARD VAN SCHOTHORST ,  DIJKSMAN JOHAN FREDERIK ,  SCHOORMANS CAROLUS JOHANNES CATHARINA ,  KOEVOETS ADRIANUS HENDRIK ,  DE SCHIFFART CATHARINUS ,  WUISTER SANDER FREDERIK

IPC: B29C59/02 ,  B81C99/00 ,  H01L21/027

CPC classification number: G03F9/7042 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

Abstract: PROBLEM TO BE SOLVED: To provide an improved imprint lithography apparatus and a method. SOLUTION: This imprint lithography apparatus includes: an imprint template holder 22 which is constituted in a manner to hold an imprint template 20; and a plurality of position sensors 28 which are constituted in a manner to measure the variation of the size and/or shape of the imprint template 20, and the position sensors 28 are mechanically separated from the imprint template 20. In addition, the imprint template 20 is used in order to imprint a pattern on a board 34, and the variation of the size and/or shape of the imprint template 20 are measured while the pattern is imprinted on the board 34 by this lithography method. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供一种改进的压印光刻设备和方法。 解决方案：该压印光刻设备包括：压印模板保持器22，其以保持压印模板20的方式构成; 以及以测量压印模板20的尺寸和/或形状的变化的方式构成的多个位置传感器28，并且位置传感器28与压印模板20机械分离。此外，压印模板 20用于在板34上印刷图案，并且通过该光刻方法在图案印刷在板34上的同时测量压印模板20的尺寸和/或形状的变化。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2009260339A

公开(公告)日：2009-11-05

申请号：JP2009092537

申请日：2009-04-07

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： BUTLER HANS ,  CUIJPERS MARTINUS AGNES WILLEM ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  DE JONGH ROBERTUS JOHANNES MAR ,  RENKENS MICHAEL JOZEF MATHIJS ,  VAN DER WIJST MARC WILHELMUS M ,  WIJCKMANS MAURICE WILLEM JOZEF ,  TOUSAIN ROBERTUS LEONARDUS ,  FAASSEN RONALD PETRUS HENDRICU ,  KOEVOETS ADRIANUS HENDRIK

IPC: H01L21/68 ,  G03F7/20 ,  H01L21/027

CPC classification number: G03F7/709 ,  G03F7/70758 ,  G03F7/70766

Abstract: PROBLEM TO BE SOLVED: To provide a positioning system in which vibrations caused by a torque transferred from a balance mass to a base plate are minimized. SOLUTION: The positioning system to position a table within a base frame of a lithographic apparatus includes a first actuator for exerting an actuation force on the table, and being connected to a first balance mass constructed and arranged to absorb a reaction force of the first actuator, and the positioning system includes a controller and a second actuator constructed and arranged to exert a compensation force and/or torque to compensate a torque caused by the actuation force exerted by the first actuator on the first balance mass. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供一种定位系统，其中由从平衡块传递到基板的扭矩引起的振动最小化。 解决方案：用于将工作台定位在光刻设备的基架内的定位系统包括用于在工作台上施加致动力的第一致动器，并且连接到构造和布置成吸收反应力的第一平衡块 第一致动器和定位系统包括控制器和第二致动器，其构造和布置成施加补偿力和/或扭矩以补偿由第​​一致动器施加在第一平衡块上的致动力引起的扭矩。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：SG11201609284TA

公开(公告)日：2016-12-29

申请号：SG11201609284T

申请日：2015-04-24

Applicant: ASML NETHERLANDS BV

Inventor： BERENDSEN CHRISTIANUS WILHELMUS JOHANNES ,  BECKERS MARCEL ,  CASTELIJNS HENRICUS JOZEF ,  GERAETS HUBERTUS ANTONIUS ,  KOEVOETS ADRIANUS HENDRIK ,  LEVASIER LEON MARTIN ,  SCHAAP PETER ,  STREEFKERK BOB ,  TROMP SIEGFRIED ALEXANDER

IPC: G03F7/20

Abstract: A method for compensating for an exposure error in an exposure process of a lithographic apparatus that comprises a substrate table, the method comprising: obtaining a dose measurement indicative of a dose of IR radiation that reaches substrate level, wherein the dose measurement can be used to calculate an amount of IR radiation absorbed by an object in the lithographic apparatus during an exposure process; and using the dose measurement to control the exposure process so as to compensate for an exposure error associated with the IR radiation absorbed by the object during the exposure process.

公开(公告)号：SG156572A1

公开(公告)日：2009-11-26

申请号：SG2009023359

申请日：2009-04-03

Applicant: ASML NETHERLANDS BV

Inventor： BUTLER HANS ,  CUIJPERS MARTINUS AGNES WILLEM ,  HOOGENDAM CHRISTIAAN ALEXANDER ,  DE JONGH ROBERTUS JOHANNES MARINUS ,  RENKENS MICHAEL JOZEF MATHIJS ,  VAN DER WIJST MARC WILHELMUS MARIA ,  WIJCKMANS MAURICE WILLEM JOZEF ETIENNE ,  TOUSAIN ROBERTUS LEONARDUS ,  FAASSEN RONALD PETRUS HENDRICUS ,  KOEVOETS ADRIANUS HENDRIK

Abstract: A positioning system to position a table within a base frame of a lithographic apparatus, the positioning system including: a first actuator to exert an actuation force on the table, the first actuator being connected to a first balance mass constructed and arranged to absorb a reaction force of the first actuator, wherein the positioning system includes a controller and a second actuator constructed and arranged to exert a compensation force and/or torque to compensate a torque caused by the actuation force exerted by the first actuator on the first balance mass.

公开(公告)号：NL2010817A

公开(公告)日：2013-12-02

申请号：NL2010817

申请日：2013-05-17

Applicant: ASML NETHERLANDS BV

Inventor： DONDERS SJOERD NICOLAAS LAMBERTUS ,  FIEN MENNO ,  HOOGENDAM CHRISTIAAN ALEXANDER ,  HOUBEN MARTIJN ,  JACOBS JOHANNES HENRICUS WILHELMUS ,  KOEVOETS ADRIANUS HENDRIK ,  LAFARRE RAYMOND WILHELMUS LOUIS ,  OVERKAMP JIM VINCENT ,  KATE NICOLAAS ,  WESTERLAKEN JAN STEVEN CHRISTIAAN ,  GROOT ANTONIUS FRANCISCUS JOHANNES ,  BEIJNUM MAARTEN ,  JONG ROB

IPC: G03F7/20 ,  H01L21/683

Abstract: A support apparatus for a lithographic apparatus has an object holder and an extraction body radially outward of the object holder. The object holder is configured to support an object. The extraction body includes an extraction opening configured to extract fluid from a top surface of the support apparatus. The extraction body is spaced from the object holder such that the extraction body is substantially decoupled from the object holder. The extraction body comprises a projection configured such that it surrounds the object holder and such that, in use, a layer of liquid is retained on the projection and in contact with an object supported on the object holder.