公开(公告)号：JP2011151397A

公开(公告)日：2011-08-04

申请号：JP2011009381

申请日：2011-01-20

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： PATEL HRISHIKESH ,  JACOBS JOHANNES HENRICUS WILHELMUS ,  KUSTERS GERARDUS ADRIANUS ANTONIUS MARIA ,  LAURENT THIBAULT SIMON MATHIEU ,  MIRANDA MARCIO ALEXANDRE CANO ,  BLOKS RUUD HENDRICUS MARTINUS JOHANNES ,  FENG PENG ,  KUNNEN JOHAN GERTRUDIS CORNELIS

IPC: H01L21/027

CPC classification number: G03F7/2041 ,  G03F7/3085 ,  G03F7/70341 ,  G03F7/70825 ,  G03F7/70875 ,  G03F7/70916 ,  G03F7/70991 ,  H01L21/0274 ,  H01L21/67098 ,  Y10T29/49

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic process where a process error caused by one or more heat sources can be reduced or minimized. SOLUTION: An immersion lithographic apparatus is provided. The immersion lithographic apparatus has a substrate table including a drain so configured as to receive an immersion liquid leaking into a gap between the edge of a substrate on the substrate table and the edge of a concave portion where the substrate is disposed. By directing one or more jets of the liquid toward the back side of a portion that supports the substrate, at least a portion of the concave portion that supports the substrate is thermally adjusted, thus providing a thermal adjustment system in the immersion lithographic apparatus. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供可以减少或最小化由一个或多个热源引起的过程误差的光刻工艺。 解决方案：提供浸没式光刻设备。 浸没式光刻设备具有衬底台，该衬底台包括漏液，其被构造成接收浸没液体泄漏到衬底台上的衬底的边缘与设置衬底的凹部的边缘之间的间隙中。 通过将液体的一个或多个射流引导到支撑衬底的部分的后侧，至少支撑衬底的凹部的一部分被热调节，从而在浸没式光刻设备中提供热调节系统。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：NL2005874A

公开(公告)日：2011-07-25

申请号：NL2005874

申请日：2010-12-17

Applicant: ASML NETHERLANDS BV

Inventor： PATEL HRISHIKESH ,  JACOBS JOHANNES ,  KUSTERS GERARDUS ,  LAURENT THIBAULT ,  MIRANDA MARCIO ,  BLOKS RUUD ,  FENG PENG ,  KUNNEN JOHAN

IPC: G03F7/20