公开(公告)号：NL2009272A

公开(公告)日：2013-03-04

申请号：NL2009272

申请日：2012-08-03

Applicant: ASML NETHERLANDS BV

Inventor： THOMAS IVO ,  VERSPAGET COEN ,  HAM RONALD ,  LAURENT THIBAULT ,  CORCORAN GREGORY ,  BLOKS RUUD ,  PIETERSE GERBEN ,  GUNTER PIETER

IPC: G03F7/20

公开(公告)号：NL2010916A

公开(公告)日：2014-01-07

申请号：NL2010916

申请日：2013-06-05

Applicant: ASML NETHERLANDS BV ,  ASML HOLDING NV

Inventor： WESTERLAKEN JAN STEVEN CHRISTIAAN ,  BLOKS RUUD ,  DELMASTRO PETER ,  LAURENT THIBAULT ,  LEENDERS MARTINUS ,  SCHUSTER MARK ,  WARD CHRISTOPHER ,  BOXTEL FRANK

IPC: G03F7/20

Abstract: A lithographic apparatus has a support structure configured to support a patterning device, the patterning device serving to pattern a radiation beam according to a desired pattern and having a planar main surface through which the radiation beam passes; an outlet opening configured to direct a flow of a gas onto the patterning device; and an inlet opening configured to extract the gas which has exited the outlet opening, wherein the outlet opening and inlet opening are in a facing surface facing the planar main surface of the patterning device.

公开(公告)号：NL2005874A

公开(公告)日：2011-07-25

申请号：NL2005874

申请日：2010-12-17

Applicant: ASML NETHERLANDS BV

Inventor： PATEL HRISHIKESH ,  JACOBS JOHANNES ,  KUSTERS GERARDUS ,  LAURENT THIBAULT ,  MIRANDA MARCIO ,  BLOKS RUUD ,  FENG PENG ,  KUNNEN JOHAN

IPC: G03F7/20

公开(公告)号：NL2004808A

公开(公告)日：2011-01-12

申请号：NL2004808

申请日：2010-06-03

Applicant: ASML NETHERLANDS BV

Inventor： PATEL HRISHIKESH ,  STEFFENS KOEN ,  LEMPENS HAN ,  LIEROP MATHIEUS ,  METSENAERE CHRISTOPHE ,  SPRUYTENBURG PATRICK ,  VERSTRAETE JORIS ,  BLOKS RUUD ,  MIRANDA MARCIO ,  JACOBS JOHANNES ,  LIEBREGTS PAULUS ,  HAM RONALD ,  SIMONS WILHELMUS ,  DIRECKS DANIEL ,  JANSSEN FRANCISCUS ,  BERKVENS PAUL ,  BRANDS GERT-JAN

IPC: G03F7/20

Abstract: A fluid handling structure configured to supply and confine immersion liquid to a space defined between a projection system and a facing surface facing the fluid handling structure is disclosed. The fluid handling structure includes a supply passage formed therein for the passage of fluid from outside the fluid handling structure to the space, and a thermal isolator positioned adjacent the supply passage at least partly to isolate fluid in the supply passage from a thermal load induced in the fluid handling structure.

公开(公告)号：NL2010762A

公开(公告)日：2013-12-02

申请号：NL2010762

申请日：2013-05-07

Applicant: ASML NETHERLANDS BV

Inventor： LAURENT THIBAULT ,  BLOKS RUUD ,  CORTIE ROGIER ,  HOUBEN MARTIJN ,  JACOBS JOHANNES ,  LAFARRE RAYMOND ,  LEMPENS HAN ,  OVERKAMP JIM ,  PIETERSE GERBEN ,  POLET THEODORUS ,  SIMONS WILHELMUS ,  STEFFENS KOEN ,  TROMP SIEGFRIED ,  VY VAN VUONG

IPC: G03F7/20 ,  H01L21/683

公开(公告)号：NL2006913A

公开(公告)日：2012-01-17

申请号：NL2006913

申请日：2011-06-09

Applicant: ASML NETHERLANDS BV

Inventor： LAURENT THIBAULT ,  KUNNEN JOHAN ,  BADIE RAMIN ,  KUSTERS GERARDUS ,  KNARREN BASTIAAN ,  LAFARRE RAYMOND ,  STEFFENS KOEN ,  KANEKO TAKESHI ,  VOOGD ROBBERT JAN ,  CORCORAN GREGORY ,  BLOKS RUUD

IPC: G03F7/20