公开(公告)号：NL2008183A

公开(公告)日：2012-08-28

申请号：NL2008183

申请日：2012-01-26

Applicant: ASML NETHERLANDS BV

Inventor： MULDER PIETER ,  CROMWIJK JAN ,  WINKEL JIMMY ,  HOOFMAN MARJAN ,  HENDRIKS FERDINAND

IPC: G03F7/20

Abstract: An immersion lithographic apparatus is disclosed having a projection system configured to direct a patterned beam of radiation onto a substrate and a liquid handling system configured to supply and confine immersion liquid to a space defined between the projection system and a substrate, or a substrate table, or both. A controller is provided to adjust an angle of a lower surface of the liquid handling system relative to the top surface of the substrate during motion of the substrate and/or substrate table relative to the liquid handling system dependent upon a position of the substrate and/or substrate table relative to the liquid handling system and/or a direction of relative movement between the substrate and/or substrate table and the liquid handling system.

公开(公告)号：NL2006981A

公开(公告)日：2012-01-30

申请号：NL2006981

申请日：2011-06-22

Applicant: ASML NETHERLANDS BV

Inventor： SIMONS WILHELMUS ,  NIEUWELAAR NORBERTUS ,  HEERTJES MARCEL ,  GIELIS JOOST ,  HENDRIKS FERDINAND

IPC: G03F7/20 ,  G03F9/00 ,  H01L21/68