公开(公告)号：NL1036715A1

公开(公告)日：2009-10-19

申请号：NL1036715

申请日：2009-03-17

Applicant: ASML NETHERLANDS BV

Inventor： DUNGEN CLEMENS JOHANNES GERARD VAN DEN ,  KOPPELAARS NICOLAAS FRANCISCUS ,  LEENDERS MARTINUS HENDRIKUS ANTONIUS ,  LIEBREGTS PAULUS MARTINUS MARIA ,  MULKENS JOHANNES CATHARINUS HUBERTUS ,  EUMMELEN ERIK HENRICUS EGIDIUS ,  BECKERS MARCEL ,  MOERMAN RICHARD ,  GROUWSTRA CEDRIC DESIRE ,  PHILIPS DANNY MARIA HUBERTUS ,  VERHEES REMKO JAN PETER ,  MULDER PIETER ,  VLIET EVERT VAN

IPC: G03F7/20

公开(公告)号：NL2008183A

公开(公告)日：2012-08-28

申请号：NL2008183

申请日：2012-01-26

Applicant: ASML NETHERLANDS BV

Inventor： MULDER PIETER ,  CROMWIJK JAN ,  WINKEL JIMMY ,  HOOFMAN MARJAN ,  HENDRIKS FERDINAND

IPC: G03F7/20

Abstract: An immersion lithographic apparatus is disclosed having a projection system configured to direct a patterned beam of radiation onto a substrate and a liquid handling system configured to supply and confine immersion liquid to a space defined between the projection system and a substrate, or a substrate table, or both. A controller is provided to adjust an angle of a lower surface of the liquid handling system relative to the top surface of the substrate during motion of the substrate and/or substrate table relative to the liquid handling system dependent upon a position of the substrate and/or substrate table relative to the liquid handling system and/or a direction of relative movement between the substrate and/or substrate table and the liquid handling system.

公开(公告)号：NL2005951A

公开(公告)日：2011-08-03

申请号：NL2005951

申请日：2011-01-05

Applicant: ASML NETHERLANDS BV

Inventor： DIRECKS DANIEL ,  EUMMELEN ERIK ,  SCHEPERS MAIKEL ,  DUNGEN CLEMENS ,  SHULEPOV SERGEI ,  MULDER PIETER ,  BESSEMS DAVID ,  BARAGONA MARCO

IPC: G03F7/20

公开(公告)号：NL1036631A1

公开(公告)日：2009-09-25

申请号：NL1036631

申请日：2009-02-25

Applicant: ASML NETHERLANDS BV

Inventor： DIRECKS DANIEL JOZEF MARIA ,  KEMPER NICOLAAS RUDOLF ,  LIEBREGTS PAULUS MARTINUS MARIA ,  HAM RONALD VAN DER ,  SIMONS WILHELMUS FRANCISCUS JO ,  PHILIPS DANNY MARIA HUBERTUS ,  BRANDS GERT-JAN GERARDUS JOHANNES ,  STEFFENS KOEN ,  LEMPENS HAN HENRICUS ALDEGONDA ,  ZANDEN MARCUS JOHANNES VAN DER ,  MULDER PIETER

IPC: G03F7/20

公开(公告)号：NL2006389A

公开(公告)日：2011-10-18

申请号：NL2006389

申请日：2011-03-14

Applicant: ASML NETHERLANDS BV

Inventor： PHILIPS DANNY ,  DIRECKS DANIEL ,  DUNGEN CLEMENS ,  SCHEPERS MAIKEL ,  BERKVENS PAUL ,  ZANDEN MARCUS ,  MULDER PIETER

IPC: G03F7/20

Abstract: A fluid handling structure configured to supply immersion liquid to a space defined between a projection system and a facing surface facing the fluid handling structure is disclosed. An undersurface of the fluid handling structure has a supply opening configured to supply fluid toward the facing surface, a plurality of extraction openings configured to remove fluid from between the fluid handling structure and the facing surface, and a protrusion between the supply opening and the extraction openings.