Actuator, positioning system, and lithographic apparatus
    1.
    发明专利
    Actuator, positioning system, and lithographic apparatus 有权
    执行器,定位系统和平面设备

    公开(公告)号:JP2011072184A

    公开(公告)日:2011-04-07

    申请号:JP2010206325

    申请日:2010-09-15

    Abstract: PROBLEM TO BE SOLVED: To provide an actuator for exerting a force and a torque on an object. SOLUTION: The actuator includes a first part that is movable with respect to a second part of the actuator in at least a first degree of freedom. The object is mounted to the first part. One of these parts is provided with a first electrical coil that is arranged to cooperate with a magnetizable portion of the other part. A controller of the actuator is configured to generate a first electrical current through the first electrical coil for generating a force between these parts. The one of these parts is provided with a second electrical coil which is arranged to cooperate with a magnetizable portion of the other part, and the controller is further configured to generate a second electrical current through the second coil and the first electrical current through the first electrical coil for exerting the force and torque between these parts. Therefore, the actuator is configured to exert the force and the torque on the object with respect to the second part. COPYRIGHT: (C)2011,JPO&INPIT

    Abstract translation: 要解决的问题:提供用于在物体上施加力和扭矩的致动器。 解决方案:致动器包括能够以至少第一自由度相对于致动器的第二部分移动的第一部件。 物体安装到第一部分。 这些部件中的一个设置有第一电线圈,其布置成与另一部分的可磁化部分配合。 致动器的控制器被配置为产生通过第一电线圈的第一电流,以在这些部件之间产生力。 这些部件中的一个设置有第二电线圈,其布置成与另一部分的可磁化部分配合,并且控制器还被配置为产生通过第二线圈的第二电流和通过第一线圈的第一电流 用于在这些部件之间施加力和扭矩的电线圈。 因此,致动器构造成相对于第二部分施加力和扭矩对物体。 版权所有(C)2011,JPO&INPIT

    Positioning system and method for positioning substrate to frame
    2.
    发明专利
    Positioning system and method for positioning substrate to frame 审中-公开
    定位系统和将基板定位到框架的方法

    公开(公告)号:JP2011040740A

    公开(公告)日:2011-02-24

    申请号:JP2010173783

    申请日:2010-08-02

    CPC classification number: G03F7/70758

    Abstract: PROBLEM TO BE SOLVED: To provide an improved positioning system of lithography equipment in which heat to generate force is not produced in a sub-stage or its vicinity. SOLUTION: In this positioning system, a sub-stage 9 is movable in one direction between a first position 11 and a second position 13 against a main-stage 5. This method includes positioning the first stage using a passive force system which starts moving by the positioning of the main-stage 5. The passive force system includes tow magnet systems 19 and 21, and each magnet system 19 or 21 is formed as to provide a non-contact force to the second stage against the first stage in the above direction. Force is generated as a resultant force in the above moving direction by the passive force system and given to the first stage, and the magnitude and/or direction of the resultant force are determined based on the position of the first stage against the second stage. The first stage has a zero force position 23 to be zero in resultant force in between the first position 11 and the second position 13. COPYRIGHT: (C)2011,JPO&INPIT

    Abstract translation: 要解决的问题:提供一种改进的光刻设备的定位系统,其中在次级或其附近不产生产生力的热量。 解决方案:在该定位系统中,子级9可以在第一位置11和第二位置13之间的一个方向上抵靠主级5移动。该方法包括使用被动力系统定位第一级, 通过主级5的定位开始移动。被动力系统包括丝束磁体系统19和21,并且每个磁体系统19或21形成为在第二阶段中相对于第一阶段提供非接触力 上述方向。 通过被动力系统产生作为上述移动方向的合力并施加到第一阶段的力,并且基于第一阶段相对于第二阶段的位置来确定合力的大小和/或方向。 第一阶段在第一位置11和第二位置13之间的合力中具有为零的零力位置23。(C)2011,JPO和INPIT

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