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    POSITIONING SYSTEM, LITHOGRAPHIC APPARATUS AND METHOD.
    2.
    发明专利
    POSITIONING SYSTEM, LITHOGRAPHIC APPARATUS AND METHOD. 未知

    公开(公告)号：NL2005013A

    公开(公告)日：2011-02-02

    申请号：NL2005013

    申请日：2010-07-01

    Applicant: ASML NETHERLANDS BV

    Inventor： EIJK JAN ,  PASCH ENGELBERTUS ,  VERMEULEN JOHANNES

    IPC: G03F7/20 ,  G03F9/00

    Abstract: A positioning system to position a movable object having a body, the positioning system includes an object position measurement system, an object actuator, and an object controller, wherein the positioning system further includes a stiffener to increase the stiffness and/or to damp relative movements within the body of the object, the stiffener including; one or more sensors, wherein each sensor is arranged to determine a measurement signal representative of an internal strain or relative displacement in the body, one or more actuators, wherein each actuator is arranged to exert an actuation force on a part of the body, and at least one controller, configured to provide on the basis of the measurement signal of at least one of the sensors, an actuation signal to at least one of the actuators to increase the stiffness and/or to damp movements within the body.

    LITHOGRAPHIC APPARATUS COMPRISING SUBSTRATE TABLE.
    6.
    发明专利
    LITHOGRAPHIC APPARATUS COMPRISING SUBSTRATE TABLE. 未知

    公开(公告)号：NL2008695A

    公开(公告)日：2012-11-27

    申请号：NL2008695

    申请日：2012-04-24

    Applicant: ASML NETHERLANDS BV

    Inventor： BUTLER HANS ,  EIJK JAN ,  HOL SVEN ANTOIN JOHAN ,  VERMEULEN JOHANNES ,  HUANG YANG-SHAN

    IPC: G03F7/20 ,  H01L21/68

    Abstract: A lithographic apparatus includes an illumination system configured to condition a radiation beam and a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam. The lithographic apparatus further includes a substrate table constructed to hold a substrate; a positioner constructed to position the substrate table; a projection system configured to project the patterned radiation beam onto a target portion of the substrate; a substrate surface actuator arranged to engage a part of a surface of the substrate facing the projection system, and a position controller configured to control a position of the substrate table, the position controller being arranged to drive the positioner and the substrate surface actuator.

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