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    POSITION SENSOR AND LITHOGRAPHIC APPARATUS.
    2.
    发明专利
    POSITION SENSOR AND LITHOGRAPHIC APPARATUS. 未知

    公开(公告)号：NL2006743A

    公开(公告)日：2011-12-12

    申请号：NL2006743

    申请日：2011-05-09

    Applicant: ASML NETHERLANDS BV

    Inventor： BEERENS RUUD ,  GROOT ANTONIUS ,  VERMEULEN JOHANNES

    IPC: G03F7/20 ,  G03F9/00

    Abstract: A position sensor is configured to measure a position data of a target. The position sensor includes a radiation source configured to irradiate a radiation beam, a first grating configured to diffract the radiation beam in a first diffraction direction into at least a first order diffraction beam, and a second grating, arranged in an optical path of the first order diffraction beam, the second grating being configured to diffract the first order diffraction beam diffracted at the first grating in a second diffraction direction substantially perpendicular to the first diffraction direction. The second grating is connected to the target. A first detector is configured to detect at least a part of the beam diffracted by the first grating, and at least one second detector is configured to detect at least part of the beam diffracted by the first grating and the second grating.

    ACTUATOR, POSITIONING SYSTEM AND LITHOGRAPHIC APPARATUS.
    3.
    发明专利
    ACTUATOR, POSITIONING SYSTEM AND LITHOGRAPHIC APPARATUS. 未知

    公开(公告)号：NL2005240A

    公开(公告)日：2011-03-23

    申请号：NL2005240

    申请日：2010-08-18

    Applicant: ASML NETHERLANDS BV

    Inventor： HOL SVEN ,  GROOT ANTONIUS ,  CADEE THEODORUS ,  KESSELS MARIJN ,  HOBBELEN DAAN

    IPC: G03F7/20 ,  H01L21/68

    Abstract: Actuator for exerting a force and a torque on an object, wherein the actuator includes a first part that is movable with respect to a second part of the actuator in at least a first degree of freedom, wherein the object is mounted to the first part, wherein one of the parts is provided with a first electrical coil that is arranged to cooperate with a magnetizable portion of the other part and wherein a controller of the actuator is arranged to generate a first electrical current through the first electrical coil for generating a force between the parts, wherein the one of the parts is provided with a second electrical coil which is arranged to cooperated with a magnetizable portion of the other part, wherein the controller is further arranged to generate a second current through the second coil and the first current through the first electrical coil for exerting the force and torque between the parts so that the actuator is arranged to exert the force and the torque on the object with respect to the second part.

    LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD.
    6.
    发明专利
    LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD. 未知

    公开(公告)号：NL2006190A

    公开(公告)日：2011-09-13

    申请号：NL2006190

    申请日：2011-02-11

    Applicant: ASML NETHERLANDS BV

    Inventor： VALENTIN CHRISTIAAN LOUIS ,  VERMEULEN JOHANNES ,  GROOT ANTONIUS ,  MUNNIG SCHMIDT ROBERT-HAN ,  BREE BARTHOLOMEUS

    IPC: G03F7/20

    Abstract: A lithographic apparatus includes an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate; and a projection system configured to project the patterned radiation beam onto a target portion of the substrate. An optical element of the projection system is adjustable. The lithographic apparatus includes a controller to control the adjustable optical element. The controller is arranged to drive the optical element so as to at least partly compensate for a magnification resulting from a bending of the patterning device.

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