公开(公告)号：JP2006245571A

公开(公告)日：2006-09-14

申请号：JP2006049444

申请日：2006-02-27

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： KOK HAICO VICTOR ,  VAN DE KERKHOF MARCUS A ,  KRUIZINGA BORGERT ,  SENGERS TIMOTHEUS F ,  MOEST BEARRACH ,  HAAST MARC ANTONIUS MARIA ,  WEISSBRODT PETER WERNER ,  SCHRENK MANFRED HELMUT GUSTAV ,  HARZENDORF TORSTEN

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/7085

Abstract: PROBLEM TO BE SOLVED: To provide a sensor at a substrate level suitable for use in a system having high sensitivity and NA. SOLUTION: A sensor used at a substrate level in a lithography system having high NA has a transparent plate covering sensing elements, and arrangement for improving coupling between radiation and the sensing elements. The arrangement includes a Fresnel lens, a holographic optical element, a reverse Winston cone, a spherical lens, and surface roughening. COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种适于在具有高灵敏度和NA的系统中使用的基板级的传感器。 解决方案：在具有高NA的光刻系统中在基底层处使用的传感器具有覆盖感测元件的透明板，以及用于改善辐射与感测元件之间的耦合的装置。 该装置包括菲涅尔透镜，全息光学元件，反向温斯顿锥体，球面透镜和表面粗糙化。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：SG125238A1

公开(公告)日：2006-09-29

申请号：SG200601220

申请日：2006-02-24

Applicant: ASML NETHERLANDS BV

Inventor： KOK HAICO VICTOR ,  KERKHOF VAN DE MARCUS ADRIANUS ,  KRUIZINGA BORGERT ,  SENGERS TIMOTHEUS FRANCISCUS ,  MOEST BEARRACH ,  HAAST MARC ANTONIUS MARIA ,  WEISSBRODT PETER WERNER ,  SCHRENK MANFRED HELMUT GUSTAV ,  HARZENDORF TORSTEN

Abstract: A sensor for use at substrate level in a high-NA lithographic apparatus has a transparent plate covering a sensing element and arrangements to improve coupling of radiation into the sensing element, including Fresnel lenses, holographic optical elements, inverted Winston Cones, spherical lenses and surface roughening.

公开(公告)号：DE602006000357T2

公开(公告)日：2008-12-11

申请号：DE602006000357

申请日：2006-02-17

Applicant: ASML NETHERLANDS BV

Inventor： KOK HAICO VICTOR ,  VAN DE KERKHOF MARCUS ADRIANUS ,  KRUIZINGA BORGERT ,  SENGERS TIMOTHEUS FRANCISCUS ,  MOEST BEARRACH ,  HAAST MARC ANTONIUS MARIA ,  WEISSBRODT PETER WERNER ,  SCHRENK MANFRED HELMUT GUSTAV WILHELM JOHANN ,  HARZENDORF TORSTEN

IPC: G03F7/20

Abstract: A sensor (30) for use at substrate level in a high-NA lithographic apparatus has a transparent plate (22) covering a sensing element (25) and arrangements to improve coupling of radiation into the sensing element, including Fresnel lenses (31), holographic optical elements, inverted Winston Cones, spherical lenses and surface roughening.

公开(公告)号：DE602006000357D1

公开(公告)日：2008-02-07

申请号：DE602006000357

申请日：2006-02-17

Applicant: ASML NETHERLANDS BV

Inventor： KOK HAICO VICTOR ,  VAN DE KERKHOF MARCUS ADRIANUS ,  KRUIZINGA BORGERT ,  SENGERS TIMOTHEUS FRANCISCUS ,  MOEST BEARRACH ,  HAAST MARC ANTONIUS MARIA ,  WEISSBRODT PETER WERNER ,  SCHRENK MANFRED HELMUT GUSTAV ,  HARZENDORF TORSTEN

IPC: G03F7/20

Abstract: A sensor (30) for use at substrate level in a high-NA lithographic apparatus has a transparent plate (22) covering a sensing element (25) and arrangements to improve coupling of radiation into the sensing element, including Fresnel lenses (31), holographic optical elements, inverted Winston Cones, spherical lenses and surface roughening.