公开(公告)号：JP2010093252A

公开(公告)日：2010-04-22

申请号：JP2009225775

申请日：2009-09-30

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： COMPEN RENE THEODORUS PETRUS ,  VERMAELEN MARKUS MARTINUS PETRUS ADRIANUS ,  JEUNINK ANDRE BERNARDUS ,  LOOPSTRA ERIK ROELOF ,  OTTENS JOOST JEROEN ,  SMITS PETER ,  VAN ABEELEN HENDRIKUS JOHANNES MARINUS ,  MEULENDIJKS ANTONIUS ARNOLDUS ,  HOUBEN MARTIJN ,  LEENAARS RENE WILHELMUS ANTONIUS HUBERTUS

IPC: H01L21/027 ,  G03F7/20 ,  H01L21/68

CPC classification number: G03F7/70716 ,  G03F7/70775

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus that prevents the slip occurring on a substrate table. SOLUTION: The lithographic apparatus includes an illumination system IL configured to adjust a radiation beam B; a support MT constructed to support a patterning device MA, the patterning device imparting the radiation beam B with a pattern in its cross-section to form a patterned radiation beam; a mirror block MB provided with the substrate table WT constructed to hold a substrate W; and a projection system PS configured to project the patterned radiation beam onto a target portion of the substrate W, wherein the mirror block MB is constructed and arranged to reduce slip between the mirror block MB and the substrate table WT. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供一种防止在基板台上发生滑动的光刻设备。 解决方案：光刻设备包括被配置为调节辐射束B的照明系统IL; 构造成支撑图案形成装置MA的支撑件MT，所述图案形成装置在其横截面中赋予辐射束B以图案以形成图案化的辐射束; 设置有构造成保持衬底W的衬底台WT的镜块MB; 以及投影系统PS，其被配置为将图案化的辐射束投影到基板W的目标部分上，其中，镜块MB被构造和布置成减小镜块MB和衬底台WT之间的滑动。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：NL2003470A

公开(公告)日：2010-04-08

申请号：NL2003470

申请日：2009-09-11

Applicant: ASML NETHERLANDS BV

Inventor： COMPEN RENE ,  LEENAARS RENE WILHELMUS ANTONIUS HUBERTUS ,  VERMEULEN MARCUS MARTINUS PETRUS ADRIANUS ,  JEUNINK ANDRE ,  LOOPSTRA ERIK ,  OTTENS JOOST ,  SMITS PETER ,  ABEELEN HENDRIKUS ,  MEULENDIJKS ANTONIUS ,  HOUBEN MARTIJN

IPC: G03F7/20