公开(公告)号：JP2009272631A

公开(公告)日：2009-11-19

申请号：JP2009111986

申请日：2009-05-01

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： JACOBS JOHANNES HENRICUS WILHE ,  ANTONIUS LEENDERS MARTINUS HEN ,  VAN DER MEULEN FRITS ,  OTTENS JOOST JEROEN ,  SIJBEN ANKO JOZEF CORNELUS ,  MAAS WOUTERUS JOHANNES PETRUS ,  VAN ABEELEN HENDRIKUS JOHANNES ,  VERSTEIJNEN HENRICUS PETRUS ,  STEFFENS PAULA

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70875 ,  G03F7/70341 ,  G03F7/70716

Abstract: PROBLEM TO BE SOLVED: To disclose a substrate table where heaters are arranged in consideration of a countermeasure for thermal load which may be exerted to a substrate. SOLUTION: The heaters are grouped into zones for control improvement. For each zone, a temperature sensor can be prepared. The temperature sensors can be embedded in the substrate table. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：考虑到可能施加到基板的热负荷的对策来公开加热器布置的基板台。

解决方案：将加热器分组成区域以进行控制改进。 对于每个区域，可以准备温度传感器。 温度传感器可嵌入基板台。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2009038373A

公开(公告)日：2009-02-19

申请号：JP2008194809

申请日：2008-07-29

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： BECKERS MARCEL ,  VAN DE KERKHOF MARCUS A ,  SIEBE LANDHEER ,  MAAS WOUTERUS JOHANNES PETRUS ,  BRUIJSTENS JEROEN PETER JOHANN ,  THOMAS IVO ADAM JOHANNES ,  JANSSEN FRANCISCUS JOHANNES JO ,  VAN OERLE BARTHOLOMEUS MATHIAS

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/70808 ,  G03F7/70958

Abstract: PROBLEM TO BE SOLVED: To limit movement of an immersion liquid in a gap between a liquid immersion system structure and a projection system and reduce the amount of the immersion liquid flowing out from an immersion system through the gap. SOLUTION: A lithographic apparatus includes the projection system configured to project a patterned radiation beam on a target part on a substrate. The lithographic apparatus also includes a barrier member surrounding space between the projection system and the substrate in use so as to define a reservoir for liquid partly together with the projection system. An outer surface in the radial direction of the barrier member facing a part of the projection system and a part of an outer surface in the radial direction of the projection system facing the barrier member each include a liquid repellent outer surface. The liquid repellent outer surface of the barrier member and/or the part of the liquid repellent outer surface of the projection system include an inner rim which defines the reservoir partly. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：为了限制浸没液体在液浸系统结构和投影系统之间的间隙中的移动，并且减少从浸没系统通过间隙流出的浸没液体的量。 解决方案：光刻设备包括投影系统，该投影系统被配置为将图案化的辐射束投影在基板上的目标部分上。 光刻设备还包括在使用中围绕投影系统和基板之间的空间的阻挡构件，以便与投影系统一起部分地限定用于液体的储存器。 面向突出系统的一部分的阻挡构件的径向的外表面和面向阻挡构件的投影系统的径向的外表面的一部分各自包括拒液性外表面。 阻挡构件的防液外表面和/或突出体系的防液外表面的一部分包括部分地限定储存器的内缘。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：SG113011A1

公开(公告)日：2005-07-28

申请号：SG200407675

申请日：2004-12-22

Applicant: ASML NETHERLANDS BV

Inventor： OTTENS JOOST JEROEN ,  VAN DER SCHOOT HARMEN KLASS ,  STARREVELD JEROEN PIETER ,  MAAS WOUTERUS JOHANNES PETRUS ,  VENEMA WILLEM JURRIANUS ,  MENCHTCHIKOV BORIS

IPC: G03F9/00 ,  G03F7/20 ,  H01L21/027

Abstract: A method and apparatus of correcting thermally-induced field deformations of a lithographically exposed substrate, is presented herein. In one embodiment, the method includes exposing a pattern onto a plurality of fields of a substrate in accordance with prespecified exposure information and measuring attributes of the fields to assess deformation of the fields induced by thermal effects of the exposing process. The method further includes determining corrective information based on the measured attributes, and adjusting the prespecified exposure information, based on the corrective information, to compensate for the thermally-induced field deformations. Other embodiments include the use of predictive models to predict thermally-induced effects on the fields and thermographic imaging to determine temperature variations across a substrate.

公开(公告)号：NL1036835A1

公开(公告)日：2009-11-11

申请号：NL1036835

申请日：2009-04-08

Applicant: ASML NETHERLANDS BV

Inventor： JACOBS JOHANNES HENRICUS WILHELMUS JACOBS ,  LEENDERS MARTINUS HENDRIKUS ANTONIUS ,  MEULEN FRITS VAN DER ,  OTTENS JOOST JEROEN ,  SIJBEN ANKO JOZEF CORNELUS ,  MAAS WOUTERUS JOHANNES PETRUS ,  ABEELEN HENDRIKUS JOHANNES MARIA ,  VERSTEIJNEN HENRICUS PETRUS ,  STEFFENS PAULA

IPC: G03F7/20