公开(公告)号：JP2007208257A

公开(公告)日：2007-08-16

申请号：JP2007012368

申请日：2007-01-23

Applicant: Asml Netherlands Bv ,  Carl Zeiss Smt Ag ,  エーエスエムエル ネザーランズ ビー.ブイ. ,  カール・ツァイス・エスエムティー・アーゲー

Inventor： LOOPSTRA ERIK R ,  ENGELEN ADRIANUS FRANCISCUS PE ,  LUTTIKHUIS BERNARDUS ANTONIUS ,  RUBINGH MARIA JOHANNA AGNES ,  HAZENBERG JOHANNES MARTINUS AN ,  JORRITSMA LAURENTIUS CATRINUS ,  DE KLERK JOHANNES W ,  GEUPPERT BERNHARD ,  SCHAPP PETER ,  VAN BEUZEKOM AART ADRIANUS ,  PETRUS FRANCISCUS WILHELMUS MA ,  SORG FRANZ ,  DEUFEL PETER

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70308 ,  G03F7/70825 ,  G03F7/70933

Abstract: PROBLEM TO BE SOLVED: To provide a lithography apparatus having improved focusing ability, a method of manufacturing a device, and an exchangeable optical element. SOLUTION: A projection system PS has one or several faces PP which correspond to Fourier conjugate of an object surface at which a patterning device MA is disposed, or an image surface at which a substrate W is disposed. Such a surface is known as pupil surface. While a projection image can be usefully improved by disposing an optical element 10 in the pupil surface, the system further has an assembly in which the optical element 10 can be exchanged in the pupil surface. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：提供一种具有改进的聚焦能力的光刻设备，一种制造器件的方法和可更换的光学元件。 解决方案：投影系统PS具有一个或多个对应于设置有图案形成装置MA的物体表面的傅立叶共轭或者设置基板W的图像面的PP。 这样的表面被称为瞳孔表面。 虽然通过将光学元件10设置在瞳孔表面中可以有效地改善投影图像，但是该系统还具有其中可以在瞳孔表面中更换光学元件10的组件。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：SG11201609642QA

公开(公告)日：2016-12-29

申请号：SG11201609642Q

申请日：2015-05-12

Applicant: ASML NETHERLANDS BV

Inventor： VAN BEUZEKOM AART ADRIANUS ,  ALBERTI JOZEF AUGUSTINUS MARIA ,  SEGERS HUBERT MARIE ,  VAN DER HAM RONALD ,  FAHRNI FRANCIS ,  OLIESLAGERS RUUD ,  PIETERSE GERBEN ,  ROPS CORNELIUS MARIA ,  VAN DEN EIJNDEN PEPIJN ,  VAN DONGEN PAUL ,  WILLEMS BAS

IPC: G03F7/20

Abstract: A lithographic apparatus includes a substrate table, a post-exposure handling module, a substrate handling robot and a drying station. The substrate table is configured to support a substrate for an exposure process. The post-exposure handling module is configured to handle the substrate post-exposure. The substrate handling robot is configured to transfer the substrate from the substrate table along a substrate unloading path into the post-exposure handling module. The drying station is configured to actively remove liquid from a surface of the substrate. The drying station is located in the substrate unloading path. The drying station is located in the post-exposure handling module. The post-exposure handling module may be a substrate handler.

公开(公告)号：SG134294A1

公开(公告)日：2007-08-29

申请号：SG2007006505

申请日：2007-01-26

Applicant: ASML NETHERLANDS BV ,  ZEISS CARL SMT AG

Inventor： LOOPSTRA ERIK ROELOF ,  ENGELEN ADRIANUS FRANCISCUS PE ,  LUTTIKHUIS BERNARDUS ANTONIUS ,  RUBINGH MARIA JOHANA AGNES ,  HAZENBERG JOHANNES MARTINUS AN ,  JORRITSMA LAURENTIUS CATRINUS ,  DE KLERK JOHANNES WILHELMUS ,  GEUPPERT BERNHARD ,  SCHAAP PETER ,  VAN BEUZEKOM AART ADRIANUS ,  MANDIGERS PETRUS FRANCISCUS WI ,  SORG FRANZ ,  DEUFEL PETER

Abstract: A lithographic apparatus has an assembly to exchange optical elements in a pupil plane of its projection system. The optical elements may be pupil filters and may conform to the physical dimensions specified for a reticle standard, e.g. having sides substantially equal to 5, 6 or 9 inches.