公开(公告)号：SG11201609642QA

公开(公告)日：2016-12-29

申请号：SG11201609642Q

申请日：2015-05-12

Applicant: ASML NETHERLANDS BV

Inventor： VAN BEUZEKOM AART ADRIANUS ,  ALBERTI JOZEF AUGUSTINUS MARIA ,  SEGERS HUBERT MARIE ,  VAN DER HAM RONALD ,  FAHRNI FRANCIS ,  OLIESLAGERS RUUD ,  PIETERSE GERBEN ,  ROPS CORNELIUS MARIA ,  VAN DEN EIJNDEN PEPIJN ,  VAN DONGEN PAUL ,  WILLEMS BAS

IPC: G03F7/20

Abstract: A lithographic apparatus includes a substrate table, a post-exposure handling module, a substrate handling robot and a drying station. The substrate table is configured to support a substrate for an exposure process. The post-exposure handling module is configured to handle the substrate post-exposure. The substrate handling robot is configured to transfer the substrate from the substrate table along a substrate unloading path into the post-exposure handling module. The drying station is configured to actively remove liquid from a surface of the substrate. The drying station is located in the substrate unloading path. The drying station is located in the post-exposure handling module. The post-exposure handling module may be a substrate handler.