Patent search ap:("ASML NETHERLANDS BV") AND inv:"ALBERTI JOZEF AUGUSTINUS MARIA" Page 1

1.

发明专利
Method of transferring substrate, transfer system and lithographic projection apparatus 有权
Title translation: 传输基板，传输系统和平面投影装置的方法

公开(公告)号：JP2009135443A

公开(公告)日：2009-06-18

申请号：JP2008262677

申请日：2008-10-09

Applicant: Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.

Inventor： ALBERTI JOZEF AUGUSTINUS MARIA , VAN NUNEN GERARDUS PETRUS MATT , GROENSMIT FRANS ERIK , COMPEN RENE THEODORUS PETRUS

IPC: H01L21/68 , H01L21/027

CPC classification number: G03F7/70725 , G03F7/70633 , G03F7/70775 , G03F7/70783 , G03F9/7011

Abstract: PROBLEM TO BE SOLVED: To provide a method of transferring a substrate and a transfer system having more improved placement accuracy than hitherto known. SOLUTION: This method in a lithographic apparatus can transfer a substrate from a first substrate holder to a second substrate holder by a transfer unit based on transfer data available thereto. The second substrate holder includes a surface on which a plurality of first bars are provided. This method provides a memory in which bar position data and substrate position data are encoded. Thereby, the substrate is provided on the first substrate holder. Then, a position error and direction of the substrate are measured. The direction adjustment data are calculated based on the bar position data, the substrate position data and the measured direction. The direction of the substrate is then adjusted in accordance with the direction adjustment data. After that, the substrate is transferred from the first substrate holder to the second substrate holder by the transfer unit, and is disposed on the second substrate holder. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供一种转移基板和传输系统的方法，该方法具有比迄今已知的更好的放置精度。解决方案：光刻设备中的这种方法可以基于可用的传输数据，通过传送单元将基板从第一基板保持器传送到第二基板保持器。第二基板保持器包括其上设置有多个第一条的表面。该方法提供了一种存储器，其中对条位数据和衬底位置数据进行编码。由此，基板设置在第一基板支架上。然后，测量基板的位置误差和方向。基于杆位置数据，基板位置数据和测量方向计算方向调整数据。然后根据方向调整数据调整基板的方向。之后，通过转印单元将衬底从第一衬底保持器转移到第二衬底保持器，并且设置在第二衬底保持器上。版权所有（C）2009，JPO＆INPIT

2.

发明专利
Method of arranging substrate, method of transferring substrate, support system and lithographic projection apparatus 有权
Title translation: 安装基板的方法，基板的传输方法，支撑系统和平面投影装置

公开(公告)号：JP2009170874A

公开(公告)日：2009-07-30

申请号：JP2008264460

申请日：2008-10-10

Applicant: Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.

Inventor： ALBERTI JOZEF AUGUSTINUS MARIA , VAN NUNEN GERARDUS PETRUS MATT , GROENSMIT FRANS ERIK , COMPEN RENE THEODORUS PETRUS , SOETHOUDT ABRAHAM ALEXANDER

IPC: H01L21/68 , H01L21/027

CPC classification number: G03F7/70783 , G03F7/70633

Abstract: PROBLEM TO BE SOLVED: To provide a substrate arranging method having improved arrangement accuracy relative to known ones until now; a substrate transferring method; and a transferring system. SOLUTION: This invention is related to a method of arranging a substrate on a surface of a substrate holder provided with a plurality of bars. In this method, substrate arrangement data for allowing the substrate to be arranged at a specific position with respect to the positions of the plurality of bars located on a surface of the substrate holder are first calculated. Then, the substrate is arranged at the specific position in accordance with the substrate arrangement data. The specific position is based on an arrangement position to minimize an overlay error or based on an arrangement position to minimize deformation of the substrate. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供一种相对于迄今已知的布置精度提高的基片布置方法; 基板转印方法; 和转移系统。解决方案：本发明涉及将衬底布置在设置有多个条的衬底保持器的表面上的方法。在该方法中，首先计算用于使基板相对于位于基板保持件的表面上的多个条的位置的特定位置配置的基板布置数据。然后，基板根据基板布置数据布置在特定位置。具体位置基于布置位置，以最小化覆盖误差或者基于布置位置以最小化基板的变形。版权所有（C）2009，JPO＆INPIT

3.

发明专利
Method of transferring substrate, transfer system and lithographic projection apparatus 审中-公开
Title translation: 传输基板，传输系统和平面投影装置的方法

公开(公告)号：JP2009135442A

公开(公告)日：2009-06-18

申请号：JP2008262638

申请日：2008-10-09

Applicant: Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.

Inventor： ALBERTI JOZEF AUGUSTINUS MARIA , VAN NUNEN GERARDUS PETRUS MATT , GROENSMIT FRANS ERIK , COMPEN RENE THEODORUS PETRUS

IPC: H01L21/68 , H01L21/027

CPC classification number: G03F7/70725 , G03F7/70633 , G03F7/70775 , G03F7/70783 , G03F9/7011 , H01L21/67265 , H01L21/67745

Abstract: PROBLEM TO BE SOLVED: To provide a method of transferring a substrate and a transfer system, having more improved placement accuracy than hitherto known. SOLUTION: This method can transfer a substrate from a first substrate holder, e.g. a pre-alignment unit to a second substrate holder, e.g. a substrate table in a lithographic apparatus by a transfer unit, based on transfer data used available thereto. First, a substrate is provided to the first substrate holder. Subsequently, a positional difference of the substrate is measured and positional adjustment data are calculated based on the measured positional difference. Then, the second substrate holder is moved to its reference position in accordance with the positional adjustment data. Finally, the substrate is transferred from the first substrate holder to the second substrate holder by the transfer unit in accordance with the transfer data, and the substrate is disposed on the second substrate holder after moving. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供一种转移基板和转印系统的方法，其具有比迄今已知的更好的放置精度。解决方案：该方法可以从第一衬底保持器（例如，将预对准单元连接到第二衬底保持器，例如。基于转印单元的光刻设备中的基板，基于可用于其的转印数据。首先，将基板设置到第一基板保持器。随后，测量基板的位置差异，并且基于所测量的位置差来计算位置调整数据。然后，根据位置调整数据将第二基板支架移动到其基准位置。最后，根据传送数据，通过转印单元将衬底从第一衬底保持器转移到第二衬底保持器，并且衬底在移动之后设置在第二衬底保持器上。版权所有（C）2009，JPO＆INPIT

4.

发明专利
LITHOGRAPHIC APPARATUS, METHOD OF TRANSFERRING A SUBSTRATE AND DEVICE MANUFACTURING METHOD 未知

公开(公告)号：SG11201609642QA

公开(公告)日：2016-12-29

申请号：SG11201609642Q

申请日：2015-05-12

Applicant: ASML NETHERLANDS BV

Inventor： VAN BEUZEKOM AART ADRIANUS , ALBERTI JOZEF AUGUSTINUS MARIA , SEGERS HUBERT MARIE , VAN DER HAM RONALD , FAHRNI FRANCIS , OLIESLAGERS RUUD , PIETERSE GERBEN , ROPS CORNELIUS MARIA , VAN DEN EIJNDEN PEPIJN , VAN DONGEN PAUL , WILLEMS BAS

IPC: G03F7/20

Abstract: A lithographic apparatus includes a substrate table, a post-exposure handling module, a substrate handling robot and a drying station. The substrate table is configured to support a substrate for an exposure process. The post-exposure handling module is configured to handle the substrate post-exposure. The substrate handling robot is configured to transfer the substrate from the substrate table along a substrate unloading path into the post-exposure handling module. The drying station is configured to actively remove liquid from a surface of the substrate. The drying station is located in the substrate unloading path. The drying station is located in the post-exposure handling module. The post-exposure handling module may be a substrate handler.