公开(公告)号：NL2007439A

公开(公告)日：2012-04-23

申请号：NL2007439

申请日：2011-09-19

Applicant: ASML NETHERLANDS BV

Inventor： BOXTEL FRANK ,  DAM MARINUS ,  JASPER JOHANNES ,  HAM RONALD ,  SHULEPOV SERGEI ,  PIETERSE GERBEN ,  BARAGONA MARCO ,  DEBRAUWER PIETER ,  STEEN ANTONIUS

IPC: G03F7/20

Abstract: A gas manifold to direct a gas flow between two plates of an optical component of a lithographic apparatus, the gas manifold having an inlet, a diffuser downstream of the inlet, a flow straightener downstream of the inlet, a contractor downstream of the flow straightener, and an outlet downstream of the contractor.

公开(公告)号：SG11201609642QA

公开(公告)日：2016-12-29

申请号：SG11201609642Q

申请日：2015-05-12

Applicant: ASML NETHERLANDS BV

Inventor： VAN BEUZEKOM AART ADRIANUS ,  ALBERTI JOZEF AUGUSTINUS MARIA ,  SEGERS HUBERT MARIE ,  VAN DER HAM RONALD ,  FAHRNI FRANCIS ,  OLIESLAGERS RUUD ,  PIETERSE GERBEN ,  ROPS CORNELIUS MARIA ,  VAN DEN EIJNDEN PEPIJN ,  VAN DONGEN PAUL ,  WILLEMS BAS

IPC: G03F7/20

Abstract: A lithographic apparatus includes a substrate table, a post-exposure handling module, a substrate handling robot and a drying station. The substrate table is configured to support a substrate for an exposure process. The post-exposure handling module is configured to handle the substrate post-exposure. The substrate handling robot is configured to transfer the substrate from the substrate table along a substrate unloading path into the post-exposure handling module. The drying station is configured to actively remove liquid from a surface of the substrate. The drying station is located in the substrate unloading path. The drying station is located in the post-exposure handling module. The post-exposure handling module may be a substrate handler.

公开(公告)号：SG188036A1

公开(公告)日：2013-03-28

申请号：SG2012052569

申请日：2012-07-17

Applicant: ASML NETHERLANDS BV

Inventor： KUNNEN JOHAN GERTRUDIS CORNELIS ,  JACOBS JOHANNES HENRICUS WILHELMUS ,  VERSPAGET COEN CORNELIS WILHELMUS ,  VAN DER HAM RONALD ,  THOMAS IVO ADAM JOHANNES ,  HOUBEN MARTIJN ,  LAURENT THIBAULT SIMON MATHIEU ,  CORCORAN GREGORY MARTIN MASON ,  BLOKS RUUD HENDRIKUS MARTINUS JOHANNES ,  PIETERSE GERBEN ,  GUNTER PIETER LEIN JOSEPH ,  REMIE MARINUS JAN ,  DERKS SANDER CATHARINA REINIER

Abstract: LITHOGRAPHIC APPARATUS, SUPPORT TABLE FOR A LITHOGRAPHICA support table configured to support a substrate, the support table having a support section to support a substrate and a conditioning system to supply heat energy to and/or remove heat energy from the support section, wherein the conditioning system comprises a plurality of conditioning units that are independently controllable.(Figure 8)

公开(公告)号：NL2009272A

公开(公告)日：2013-03-04

申请号：NL2009272

申请日：2012-08-03

Applicant: ASML NETHERLANDS BV

Inventor： THOMAS IVO ,  VERSPAGET COEN ,  HAM RONALD ,  LAURENT THIBAULT ,  CORCORAN GREGORY ,  BLOKS RUUD ,  PIETERSE GERBEN ,  GUNTER PIETER

IPC: G03F7/20

公开(公告)号：NL2010762A

公开(公告)日：2013-12-02

申请号：NL2010762

申请日：2013-05-07

Applicant: ASML NETHERLANDS BV

Inventor： LAURENT THIBAULT ,  BLOKS RUUD ,  CORTIE ROGIER ,  HOUBEN MARTIJN ,  JACOBS JOHANNES ,  LAFARRE RAYMOND ,  LEMPENS HAN ,  OVERKAMP JIM ,  PIETERSE GERBEN ,  POLET THEODORUS ,  SIMONS WILHELMUS ,  STEFFENS KOEN ,  TROMP SIEGFRIED ,  VY VAN VUONG

IPC: G03F7/20 ,  H01L21/683