公开(公告)号：JP2008034845A

公开(公告)日：2008-02-14

申请号：JP2007189082

申请日：2007-07-20

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： ZAAL KOEN JACOBUS J M ,  OTTENS JOOST JEROEN ,  STOELDRAIJER JUDOCUS MARIE DOM ,  DE KORT ANTONIUS J ,  VAN DE MAST FRANCISCUS ,  DE JONG MARTEIJN

IPC: H01L21/027 ,  H01L21/68

CPC classification number: G03F7/70858 ,  G03F7/70516 ,  G03F7/70775

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus adapted to compensate for a disturbance of mirror surfaces. SOLUTION: The lithographic apparatus includes a system to compensate for an influence of thermal distortion of the substrate table on position measurements of the substrate table using lateral mirrors in the substrate table. Methods of calibrating a lithographic apparatus are presented which are implemented using various scan trajectories of the substrate table and measurements of the local positions and rotations of the lateral mirrors in the substrate table. A dual stage lithographic apparatus is provided with alignment marks to definitely establish the geometric configuration of the lateral mirrors, which are used only in the exposure station, so that the geometric configuration of the lateral mirrors can be measured while the substrate table is in the measurement station. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：提供适于补偿镜面干扰的光刻设备。 光刻设备包括一个系统，用于利用衬底台中的侧视镜补偿衬底台的热变形对衬底台的位置测量的影响。 提出了使用基板台的各种扫描轨迹实现的光刻设备的校准方法，以及衬底台中侧视镜的局部位置和旋转的测量。 双级光刻设备设置有对准标记，以明确地建立仅在曝光站中使用的侧视镜的几何构型，使得可以在衬底台处于测量过程中测量侧视镜的几何构型 站。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：SG178675A1

公开(公告)日：2012-03-29

申请号：SG2011057411

申请日：2011-08-10

Applicant: ASML NETHERLANDS BV

Inventor： WESTERLAKEN JAN STEVEN CHRISTIAAN ,  VAN DER PASCH ENGELBERTUS ANTONIUS FRANSISCUS ,  STEIJAERT PETER PAUL ,  VAN DE MAST FRANCISCUS ,  JANSSEN GERARDUS ARNOLDUS HENDRICUS FRANCISCUS

Abstract: A lithographic apparatus having a first outlet to provide a thermally conditioned fluidwith a first flow characteristic to at least part of a sensor beam path, and a second outlet associated with the first outlet and to provide a thermally conditioned fluid with a second flow characteristic, different to the first flow characteristic, adjacent the thermally conditioned fluid from the first outlet.[Fig. 1]

公开(公告)号：SG139674A1

公开(公告)日：2008-02-29

申请号：SG2007052996

申请日：2007-07-17

Applicant: ASML NETHERLANDS BV

Inventor： ZAAL KOEN JACOBUS JOHANNES MAR ,  OTTENS JOOST JEROEN ,  STOELDRAIJER JUDOCUS MARIE DOM ,  DE KORT ANTONIUS JOHANNES ,  VAN DE MAST FRANCISCUS ,  DE JONG MARTEIJN

Abstract: LITHOGRAPHIC APPARATUS, METHOD OF CALIBRATING A LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD A lithographic apparatus includes a system to compensate for the effect of thermal distortion of the substrate table on position measurements of the substrate table using lateral mirrors in the substrate table. Methods of calibrating a lithographic apparatus using various substrate table scan trajectories and measurements of the localized position and rotation of lateral mirrors in the substrate table are presented. A dual stage lithographic apparatus with alignment marks defining the geometry of a lateral mirror used only at the exposure station to measure the geometry of the lateral minor when the substrate table is at the measurement station.