公开(公告)号：KR20200125942A

公开(公告)日：2020-11-05

申请号：KR20207025275

申请日：2019-02-28

Applicant: ASML NETHERLANDS BV

Inventor： MA YUE ,  KEMPEN ANTONIUS THEODORUS WILHELMUS ,  HUMMLER KLAUS MARTIN ,  MOORS JOHANNES HUBERTUS JOSEPHINA ,  ROMMERS JEROEN HUBERT ,  VAN DE WIEL HUBERTUS JOHANNES ,  LAFORGE ANDREW DAVID ,  BRIZUELA FERNANDO ,  WIEGGERS ROB CARLO ,  GOMES UMESH PRASAD ,  NEDANOVSKA ELENA ,  KORKMAZ CELAL ,  KIM ALEXANDER DOWNN ,  DUARTE RODRIGUES NUNES RUI MIGUEL ,  VAN DIJCK HENDRIKUS ALPHONSUS LUDOVICUS ,  VAN DRENT WILLIAM PETER ,  JONKERS PETER GERARDUS ,  ZHU QIUSHI ,  YAGHOOBI PARHAM ,  WESTERLAKEN JAN STEVEN CHRISTIAAN ,  LEENDERS MARTINUS HENDRIKUS ANTONIUS ,  ERSHOV ALEXANDER IGOREVICH ,  FOMENKOV IGOR VLADIMIROVICH ,  LIU FEI ,  JACOBS JOHANNES HENRICUS WILHELMUS ,  KUZNETSOV ALEXEY SERGEEVICH

IPC: G03F7/20 ,  G02B5/08 ,  G02B27/00 ,  H05G2/00

Abstract: EUV 방사선을생성하기위한시스템(SO) 내의하나이상의반사광학요소의반사율열화는광학요소를포함하는진공챔버(26) 내로의가스의제어된도입에의하여감소된다. 가스는수소와같은또 다른가스의흐름에추가될수 있거나수소라디칼의도입과번갈아가며추가될수 있다.

公开(公告)号：NL2010916A

公开(公告)日：2014-01-07

申请号：NL2010916

申请日：2013-06-05

Applicant: ASML NETHERLANDS BV ,  ASML HOLDING NV

Inventor： WESTERLAKEN JAN STEVEN CHRISTIAAN ,  BLOKS RUUD ,  DELMASTRO PETER ,  LAURENT THIBAULT ,  LEENDERS MARTINUS ,  SCHUSTER MARK ,  WARD CHRISTOPHER ,  BOXTEL FRANK

IPC: G03F7/20

Abstract: A lithographic apparatus has a support structure configured to support a patterning device, the patterning device serving to pattern a radiation beam according to a desired pattern and having a planar main surface through which the radiation beam passes; an outlet opening configured to direct a flow of a gas onto the patterning device; and an inlet opening configured to extract the gas which has exited the outlet opening, wherein the outlet opening and inlet opening are in a facing surface facing the planar main surface of the patterning device.

公开(公告)号：SG178675A1

公开(公告)日：2012-03-29

申请号：SG2011057411

申请日：2011-08-10

Applicant: ASML NETHERLANDS BV

Inventor： WESTERLAKEN JAN STEVEN CHRISTIAAN ,  VAN DER PASCH ENGELBERTUS ANTONIUS FRANSISCUS ,  STEIJAERT PETER PAUL ,  VAN DE MAST FRANCISCUS ,  JANSSEN GERARDUS ARNOLDUS HENDRICUS FRANCISCUS

Abstract: A lithographic apparatus having a first outlet to provide a thermally conditioned fluidwith a first flow characteristic to at least part of a sensor beam path, and a second outlet associated with the first outlet and to provide a thermally conditioned fluid with a second flow characteristic, different to the first flow characteristic, adjacent the thermally conditioned fluid from the first outlet.[Fig. 1]

公开(公告)号：NL2010817A

公开(公告)日：2013-12-02

申请号：NL2010817

申请日：2013-05-17

Applicant: ASML NETHERLANDS BV

Inventor： DONDERS SJOERD NICOLAAS LAMBERTUS ,  FIEN MENNO ,  HOOGENDAM CHRISTIAAN ALEXANDER ,  HOUBEN MARTIJN ,  JACOBS JOHANNES HENRICUS WILHELMUS ,  KOEVOETS ADRIANUS HENDRIK ,  LAFARRE RAYMOND WILHELMUS LOUIS ,  OVERKAMP JIM VINCENT ,  KATE NICOLAAS ,  WESTERLAKEN JAN STEVEN CHRISTIAAN ,  GROOT ANTONIUS FRANCISCUS JOHANNES ,  BEIJNUM MAARTEN ,  JONG ROB

IPC: G03F7/20 ,  H01L21/683

Abstract: A support apparatus for a lithographic apparatus has an object holder and an extraction body radially outward of the object holder. The object holder is configured to support an object. The extraction body includes an extraction opening configured to extract fluid from a top surface of the support apparatus. The extraction body is spaced from the object holder such that the extraction body is substantially decoupled from the object holder. The extraction body comprises a projection configured such that it surrounds the object holder and such that, in use, a layer of liquid is retained on the projection and in contact with an object supported on the object holder.

公开(公告)号：NL2009533A

公开(公告)日：2013-05-07

申请号：NL2009533

申请日：2012-09-28

Applicant: ASML NETHERLANDS BV

Inventor： WESTERLAKEN JAN STEVEN CHRISTIAAN ,  JANSEN ROB ,  VERVOORT ERIK

IPC: G03F7/20

公开(公告)号：NL2011322A

公开(公告)日：2014-03-19

申请号：NL2011322

申请日：2013-08-20

Applicant: ASML NETHERLANDS BV

Inventor： BEERENS RUUD ANTONIUS CATHARINA MARIA ,  RUTTEN ROB JOHAN THEODOOR ,  WESTERLAKEN JAN STEVEN CHRISTIAAN ,  ZAAL KOEN JACOBUS JOHANNES MARIA ,  LIESHOUT RICHARD HENRICUS ADRIANUS ,  PASCH ENGELBERTUS ANTONIUS FRANSISCUS

IPC: G03F7/20 ,  H01L21/68

公开(公告)号：NL2010477A

公开(公告)日：2013-11-25

申请号：NL2010477

申请日：2013-03-19

Applicant: ASML NETHERLANDS BV

Inventor： LAURENT THIBAULT ,  JACOBS JOHANNES HENRICUS WILHELMUS ,  KOK HAICO ,  VIJVER YURI ,  WAL JOHANNES ,  KNARREN BASTIAAN ,  VOOGD ROBBERT JAN ,  WESTERLAKEN JAN STEVEN CHRISTIAAN ,  RIJDT HANS ,  KOOIKER EELCO ,  HURKENS-MERTENS WILHELMINA MARGARETA JOZEF ,  TEILLET YOHANN BRUNO YVON

IPC: G03F7/20

公开(公告)号：NL2009332A

公开(公告)日：2013-03-26

申请号：NL2009332

申请日：2012-08-17

Applicant: ASML NETHERLANDS BV

Inventor： LAFARRE RAYMOND ,  DONDERS SJOERD ,  GROOT ANTONIUS ,  VERMEULEN JOHANNES ,  HUANG YANG-SHAN ,  VALENTIN CHRISTIAAN LOUIS ,  SEGERS HUBERT MARIE ,  BERG JOHAN ,  WESTERLAKEN JAN STEVEN CHRISTIAAN ,  VISSER RAIMOND

IPC: G03F7/20 ,  G03F9/00

Abstract: A lithographic apparatus comprises a substrate table constructed to hold a substrate and a gripper arranged to position the substrate on the substrate table. The gripper includes an electrostatic clamp arranged to clamp the substrate at a top side thereof. The electrostatic clamp is arranged to clamp at least part of a circumferential outer zone of a top surface of the substrate. The invention provides a substrate handling method including positioning the substrate by means of a gripper on a substrate table of a lithographic apparatus. The substrate is clamped at a top side thereof by using an electrostatic clamp of the gripper.