公开(公告)号：JP2012049531A

公开(公告)日：2012-03-08

申请号：JP2011178217

申请日：2011-08-17

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： VESTERAKEN JEAN STEVEN CHRISTIAN ,  VAN DER PASCH ENGELBERTUS ANTONIUS FRANSISCUS ,  STEIJAART PETER PAUL ,  FRANCISCUS VAN DE MAST ,  JANSSEN GERARDUS ARNOLDUS HENDRICUS FRANCISCUS

IPC: H01L21/027 ,  G01B11/00

CPC classification number: G03F7/70916 ,  G03F7/70341 ,  G03F7/70608 ,  G03F7/70683 ,  G03F7/70775 ,  G03F7/7085 ,  G03F7/70908

Abstract: PROBLEM TO BE SOLVED: To reduce or remove risk of errors in sensor measurements.SOLUTION: The lithographic apparatus has a first outlet to provide a thermally conditioned fluid with a first flow characteristic to at least part of a sensor beam path, and a second outlet which is associated with the first outlet and provides a thermally conditioned fluid with a second flow characteristic different from the first flow characteristic, adjacent to the thermally conditioned fluid from the first outlet.

Abstract translation: 要解决的问题：减少或消除传感器测量中的错误风险。 解决方案：光刻设备具有第一出口，以向至少部分传感器光束路径提供具有第一流动特性的热调节流体，以及与第一出口相关联并提供热调节流体的第二出口 具有与第一流动特性不同的第二流动特性，与来自第一出口的热调节流体相邻。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：SG178675A1

公开(公告)日：2012-03-29

申请号：SG2011057411

申请日：2011-08-10

Applicant: ASML NETHERLANDS BV

Inventor： WESTERLAKEN JAN STEVEN CHRISTIAAN ,  VAN DER PASCH ENGELBERTUS ANTONIUS FRANSISCUS ,  STEIJAERT PETER PAUL ,  VAN DE MAST FRANCISCUS ,  JANSSEN GERARDUS ARNOLDUS HENDRICUS FRANCISCUS

Abstract: A lithographic apparatus having a first outlet to provide a thermally conditioned fluidwith a first flow characteristic to at least part of a sensor beam path, and a second outlet associated with the first outlet and to provide a thermally conditioned fluid with a second flow characteristic, different to the first flow characteristic, adjacent the thermally conditioned fluid from the first outlet.[Fig. 1]

公开(公告)号：SG11201608032YA

公开(公告)日：2016-10-28

申请号：SG11201608032Y

申请日：2015-03-17

Applicant: ASML NETHERLANDS BV

Inventor： JANSSEN GERARDUS ARNOLDUS HENDRICUS FRANCISCUS ,  VAN BAREN MARTIJN

IPC: G03F7/20

Abstract: A substrate handling system includes: a thermal shield for thermally insulating a space through which a substrate passes, from a thermal load originating outside the space, the thermal shield including: a first wall and a second wall with a gap therebetween, the first wall positioned between the space and the second wall; an inlet opening configured to allow a flow of gas from a gas source to enter the gap from outside the space; and an outlet opening configured to allow the flow of gas to exit the gap to outside of the space, wherein the system is configured to direct the flow of gas to enter the gap through the inlet opening, to flow through the gap and out of the gap to outside the space through the outlet opening thereby to reduce thermal fluctuations in the space due to the thermal load originating outside the space.

公开(公告)号：NL1036186A1

公开(公告)日：2009-06-04

申请号：NL1036186

申请日：2008-11-12

Applicant: ASML NETHERLANDS BV

Inventor： KROONEN ROGER JOHANNES MARIA HUBERTUS ,  CORNELISSEN SEBASTIAAN MARIA JOHANNES ,  DONDERS SJOERD NICOLAAS LAMBER ,  KATE NICOLAAS TEN ,  HAM RONALD VAN DER ,  ROSET NIEK JACOBUS JOHANNES ,  JACOBS FRANCISCUS MATHIJS ,  RIEPEN MICHEL ,  JANSSEN GERARDUS ARNOLDUS HENDRICUS FRANCISCUS ,  ROOS REINDER WIETSE ,  HOGELAND MATTIJS

IPC: G03F7/20 ,  H01L21/027