公开(公告)号：KR20180021217A

公开(公告)日：2018-02-28

申请号：KR20187004578

申请日：2011-03-17

Applicant: ASML NETHERLANDS BV

Inventor： YAKUNIN ANDREI ,  BANINE VADIM ,  LOOPSTRA ERIK ,  VAN DER SCHOOT HARMEN ,  STEVENS LUCAS ,  VAN KAMPEN MAARTEN

IPC: G03F1/62 ,  C01B32/20 ,  G02B5/08 ,  G02B5/20 ,  G03F1/24 ,  G03F7/20 ,  H01L21/027

CPC classification number: G03F1/64 ,  B82Y10/00 ,  B82Y40/00 ,  C01B32/20 ,  G02B5/0816 ,  G02B5/0891 ,  G02B5/204 ,  G02B5/208 ,  G02B27/0006 ,  G03B27/54 ,  G03F1/24 ,  G03F1/62 ,  G03F7/70058 ,  G03F7/702 ,  G03F7/70916 ,  G03F7/70958 ,  G03F7/70983 ,  G21K1/062 ,  G21K2201/061 ,  H01B1/04 ,  H01B1/24

Abstract: 리소그래피장치는방사선빔을생성하도록구성된방사선소스, 및패터닝디바이스를지지하도록구성된지지체를포함한다. 패터닝디바이스는패터닝된방사선빔을형성하기위해방사선빔에패턴을부여하도록구성된다. 방사선소스와패터닝디바이스사이에는챔버가위치된다. 챔버는방사선빔을반사시키도록구성된적어도 1 이상의광학구성요소를포함하고, 방사선소스로부터의방사선이이를통과하는것을허용하도록구성된다. 멤브레인(44)이멤브레인을통한방사선빔의통과를허용하고, 오염입자(54)들의통과를방지하도록구성된다. 챔버내부로부터챔버외부로우회경로를따라가스가흐르는것을허용하도록입자포획구조체(52)가구성된다. 우회경로는챔버내부로부터챔버외부로의오염입자(58)들의통과를실질적으로방지하도록구성된다.

公开(公告)号：KR20180031812A

公开(公告)日：2018-03-28

申请号：KR20187007749

申请日：2011-03-17

Applicant: ASML NETHERLANDS BV

Inventor： YAKUNIN ANDREI ,  BANINE VADIM ,  LOOPSTRA ERIK ,  VAN DER SCHOOT HARMEN ,  STEVENS LUCAS ,  VAN KAMPEN MAARTEN

IPC: G03F1/62 ,  C01B32/20 ,  G02B5/08 ,  G02B5/20 ,  G03F1/24 ,  G03F7/20 ,  H01L21/027

CPC classification number: G03F1/64 ,  B82Y10/00 ,  B82Y40/00 ,  C01B32/20 ,  G02B5/0816 ,  G02B5/0891 ,  G02B5/204 ,  G02B5/208 ,  G02B27/0006 ,  G03B27/54 ,  G03F1/24 ,  G03F1/62 ,  G03F7/70058 ,  G03F7/702 ,  G03F7/70916 ,  G03F7/70958 ,  G03F7/70983 ,  G21K1/062 ,  G21K2201/061 ,  H01B1/04 ,  H01B1/24

Abstract: 리소그래피장치는방사선빔을생성하도록구성된방사선소스, 및패터닝디바이스를지지하도록구성된지지체를포함한다. 패터닝디바이스는패터닝된방사선빔을형성하기위해방사선빔에패턴을부여하도록구성된다. 방사선소스와패터닝디바이스사이에는챔버가위치된다. 챔버는방사선빔을반사시키도록구성된적어도 1 이상의광학구성요소를포함하고, 방사선소스로부터의방사선이이를통과하는것을허용하도록구성된다. 멤브레인(44)이멤브레인을통한방사선빔의통과를허용하고, 오염입자(54)들의통과를방지하도록구성된다. 챔버내부로부터챔버외부로우회경로를따라가스가흐르는것을허용하도록입자포획구조체(52)가구성된다. 우회경로는챔버내부로부터챔버외부로의오염입자(58)들의통과를실질적으로방지하도록구성된다.

Abstract translation: 光刻设备包括被配置为产生辐射束的辐射源。 该光刻设备还包括被配置为支撑图案形成装置的支撑件。 图案形成装置被配置为将辐射束赋予图案以形成图案化的辐射束。 该支撑件提供有包括石墨烯层的薄膜。

公开(公告)号：SG186072A1

公开(公告)日：2013-01-30

申请号：SG2012086955

申请日：2011-03-17

Applicant: ASML NETHERLANDS BV

Inventor： YAKUNIN ANDREI ,  BANINE VADIM ,  LOOPSTRA ERIK ,  VAN DER SCHOOT HARMEN ,  STEVENS LUCAS ,  VAN KAMPEN MAARTEN

IPC: G03F1/24 ,  G03F1/62

Abstract: A lithographic apparatus includes a radiation source configured to produce a radiation beam, and a support configured to support a patterning device. The patterning device is configured to impart the radiation beam with a pattern to form a patterned radiation beam. A chamber is located between the radiation source and patterning device. The chamber contains at least one optical component configured to reflect the radiation beam, and is configured to permit radiation from the radiation source to pass therethrough. A membrane (44) is configured to permit the passage of the radiation beam, and to prevent the passage of contamination particles (54) through the membrane. A particle trapping structure (52) is configured to permit gas to flow along an indirect path from inside the chamber to outside the chamber. The indirect path is configured to substantially prevent the passage of contamination particles (58) from inside the chamber to outside the chamber.