公开(公告)号：SG185191A1

公开(公告)日：2012-11-29

申请号：SG2012020897

申请日：2012-03-22

Applicant: ASML NETHERLANDS BV

Inventor： DONDERS SJOERD NICOLAAS LAMBERTUS ,  BANINE VADIM YEVGENYEVICH ,  MOORS JOHANNES HUBERTUS JOSEPHINA ,  VERHAGEN MARTINUS CORNELIS MARIA ,  FRIJNS OLAV WALDEMAR VLADIMIR ,  VAN DONK GERRIT ,  VAN GERNER HENK JAN

Abstract: A two-phase thermal conditioning system for thermal conditioning a part of a lithographic apparatus, includes an evaporator to be positioned in thermal contact with the part of the lithographic apparatus for extracting heat from the part by evaporation of a fluid inside the evaporator; a condenser to be positioned at a distance from the part of the lithographic apparatus for removing heat from the fluid inside the condenser by condensation of the fluid inside the condenser; fluid lines arranged between the evaporator and the condenser to form a circuit in which fluid is able to flow; a pump arranged in the circuit to circulate the fluid in the circuit; an accumulator configured to hold fluid, wherein the accumulator is in fluid communication with the circuit and comprises a heat exchanger to transfer heat from or to fluid inside the accumulator; a temperature sensor configured to provide a measurement signal representative of the temperature of the fluid; and a controller configured to maintain a substantially constant temperature of the fluid inside the circuit by regulating the amount of heat transferred by the heat exchanger from or to fluid inside the accumulator based on the measurement signal.(Figure 2)