Patent search ap:("ASML NETHERLANDS BV") AND inv:"VEER JACOB KORNELIS" Page 1

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发明专利
VARIABLE RELUCTANCE DEVICE, STAGE APPARATUS, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD. 未知

公开(公告)号：NL2007501A

公开(公告)日：2013-04-02

申请号：NL2007501

申请日：2011-09-29

Applicant: ASML NETHERLANDS BV

Inventor： HOL SVEN ANTOIN JOHAN , AANGENENT WOUTER , CLIJSEN GEORGE , AKKERMANS JOHANNES , VEER JACOB KORNELIS , BOEIJ JEROEN , VERMEULEN JOHANNES

IPC: G03F7/20 , G03F9/00 , H01L21/68

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