公开(公告)号：WO2014202585A3

公开(公告)日：2015-08-20

申请号：PCT/EP2014062691

申请日：2014-06-17

Applicant: ASML NETHERLANDS BV

Inventor： NIKIPELOV ANDREY ,  FRIJNS OLAV ,  DE VRIES GOSSE ,  LOOPSTRA ERIK ,  BANINE VADIM ,  DE JAGER PIETER ,  DONKER RILPHO ,  NIENHUYS HAN-KWANG ,  KRUIZINGA BORGERT ,  ENGELEN WOUTER ,  LUITEN OTGER ,  AKKERMANS JOHANNES ,  GRIMMINCK LEONARDUS ,  LITVINENKO VLADIMIR

IPC: H01S3/09 ,  G01J1/04 ,  G02B1/06 ,  G02B5/20 ,  G02B26/02 ,  G03F7/20 ,  G21K1/10 ,  H01S3/00 ,  H05H7/04

CPC classification number: G03F7/70033 ,  G01J1/0407 ,  G01J1/0418 ,  G01J1/26 ,  G01J1/429 ,  G02B1/06 ,  G02B5/205 ,  G02B26/023 ,  G03F7/70008 ,  G03F7/7055 ,  G03F7/70558 ,  G03F7/7085 ,  G21K1/10 ,  H01S3/005 ,  H01S3/0085 ,  H01S3/0903 ,  H05H7/04

Abstract: A method of patterning lithographic substrates, the method comprising using a free electron laser (FEL) to generate EUV radiation and delivering the EUV radiation to a lithographic apparatus (LA) which projects the EUV radiation onto lithographic substrates, wherein the method further comprises reducing fluctuations in the power of EUV radiation delivered to the lithographic substrates by using a feedback-based control loop (CT) to monitor the free electron laser and adjust operation of the free electron laser accordingly.

Abstract translation: 一种图案化平版印刷基板的方法，所述方法包括使用自由电子激光器（FEL）产生EUV辐射并将EUV辐射传送到将EUV辐射投影到平版印刷基板上的光刻设备（LA），其中所述方法还包括减小波动 通过使用基于反馈的控制回路（CT）来监测自由电子激光器并相应地调节自由电子激光器的操作，将EUV辐射的功率传递到光刻基板。

公开(公告)号：NL2008353A

公开(公告)日：2012-10-02

申请号：NL2008353

申请日：2012-02-27

Applicant: ASML NETHERLANDS BV

Inventor： VERMEULEN JOHANNES ,  AKKERMANS JOHANNES ,  WAL MARINUS ,  BEERENS RUUD ,  HUANG YANG-SHAN ,  AANGENENT WOUTER

IPC: G03F7/20

公开(公告)号：NL2006601A

公开(公告)日：2011-06-09

申请号：NL2006601

申请日：2011-04-14

Applicant: ASML NETHERLANDS BV

Inventor： BANINE VADIM ,  LOOPSTRA ERIK ,  CADEE THEODORUS ,  AKKERMANS JOHANNES ,  SCACCABAROZZI LUIGI

IPC: G03F7/20 ,  H01L21/687

公开(公告)号：NL2013663A

公开(公告)日：2015-05-07

申请号：NL2013663

申请日：2014-10-22

Applicant: ASML NETHERLANDS BV

Inventor： AKKERMANS JOHANNES ,  AMENT LUCAS ,  BANINE VADIM ,  COENEN TEIS JOHAN ,  JAGER PIETER ,  VRIES GOSSE ,  FRIJNS OLAV ,  GRIMMINCK LEONARDUS ,  KATALENIC ANDELKO ,  LOOPSTRA ERIK ,  LUITEN OTGER ,  NIKIPELOV ANDREY

IPC: G03F7/20 ,  H01S3/00

公开(公告)号：NL2013014A

公开(公告)日：2014-12-22

申请号：NL2013014

申请日：2014-06-17

Applicant: ASML NETHERLANDS BV

Inventor： NIKIPELOV ANDREY ,  FRIJNS OLAV ,  VRIES GOSSE ,  LOOPSTRA ERIK ,  BANINE VADIM ,  JAGER PIETER ,  DONKER RILPHO ,  NIENHUYS HAN-KWANG ,  KRUIZINGA BORGERT ,  ENGELEN WOUTER ,  LUITEN OTGER ,  AKKERMANS JOHANNES ,  GRIMMINCK LEONARDUS ,  LITVINENKO VLADIMIR

IPC: G03F7/20

Abstract: A method of patterning lithographic substrates, the method comprising using a free electron laser to generate EUV radiation and delivering the EUV radiation to a lithographic apparatus which projects the EUV radiation onto lithographic substrates, wherein the method further comprises reducing fluctuations in the power of EUV radiation delivered to the lithographic substrates by using a feedback-based control loop to monitor the free electron laser and adjust operation of the free electron laser accordingly.

公开(公告)号：NL2007501A

公开(公告)日：2013-04-02

申请号：NL2007501

申请日：2011-09-29

Applicant: ASML NETHERLANDS BV

Inventor： HOL SVEN ANTOIN JOHAN ,  AANGENENT WOUTER ,  CLIJSEN GEORGE ,  AKKERMANS JOHANNES ,  VEER JACOB KORNELIS ,  BOEIJ JEROEN ,  VERMEULEN JOHANNES

IPC: G03F7/20 ,  G03F9/00 ,  H01L21/68

公开(公告)号：NL2006699A

公开(公告)日：2011-12-06

申请号：NL2006699

申请日：2011-05-02

Applicant: ASML NETHERLANDS BV

Inventor： AKKERMANS JOHANNES ,  CADEE THEODORUS ,  CLIJSEN GEORGE

IPC: G03F7/20 ,  H01L21/68

Abstract: A stage apparatus to position an object, the stage apparatus including a table configured to hold the object, a support structure configured to support the table, the table being displaceable relative to the support structure, the support structure including one of a first data clock and a second data clock and the table including the other one of the first data clock and the second data clock; and a circuit configured to synchronize the first and second data clocks, the circuit including a transmitter and receiver, the transmitter configured to wirelessly transmit clock signal data from the first data clock to the second data clock, and a synchronization circuit configured to synchronize the second data clock with the first data clock from the wirelessly transmitted clock signal data received by the receiver.