公开(公告)号：JP2006121078A

公开(公告)日：2006-05-11

申请号：JP2005301607

申请日：2005-10-17

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： MERTENS JEROEN JOHANNES SOPHIA ,  DONDERS SJOERD NICOLAAS L ,  DE GRAAF ROELOF FREDERIK ,  HOOGENDAM CHRISTIAAN ALEXANDER ,  VAN DER NET ANTONIUS J ,  TEUNISSEN FRANCISCUS JOHANNES ,  TINNEMANS PATRICIUS ALOYSIUS J ,  VERHAGEN MARTINUS CORNELIS MAR ,  VERSPAY JACOBUS JOHANNUS LEONA ,  VAN GOMPEL EDWIN AUGUSTINUS MA

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70716 ,  G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide an upgraded system as well as a method that discharges a mixture of liquid and gas from a component of lithography equipment. SOLUTION: This is lithography equipment including a liquid supply system for immersing, in liquid, a space between a projection system and a substrate, an outlet for eliminating a mixture of liquid and and gas that passes a gap between a liquid sealing structure of the liquid supply system and the substrate, and a discharge system for taking out the mixture through the outlet, wherein the discharge system includes a separator tank for separating the liquid from the gas in the mixture, and a separator tank pressure controller connected to a non-liquid immersion area of the separator tank and maintaining stable pressure in the non-liquid immersion area. COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供升级系统以及从光刻设备的部件排出液体和气体的混合物的方法。 解决方案：这是一种光刻设备，其包括用于在液体中浸入投影系统和基板之间的空间的液体供应系统，用于消除液体和气体混合物的出口，该出口通过液体密封结构 的液体供给系统和基板，以及用于通过出口取出混合物的排出系统，其中排出系统包括用于将液体与混合物中的气体分离的分离罐，以及分离罐压力控制器，其连接到 分离罐的非液浸区域，并且在非液浸区域保持稳定的压力。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2009200530A

公开(公告)日：2009-09-03

申请号：JP2009138068

申请日：2009-06-09

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： MERTENS JEROEN JOHANNES SOPHIA ,  DONDERS SJOERD NICOLAAS L ,  DE GRAAF ROELOF FREDERIK ,  HOOGENDAM CHRISTIAAN ALEXANDER ,  VAN DER NET ANTONIUS J ,  TEUNISSEN FRANCISCUS JOHANNES ,  TINNEMANS PATRICIUS ALOYSIUS J ,  VERHAGEN MARTINUS CORNELIS MAR ,  VERSPAY JACOBUS JOHANNUS LEONA ,  VAN GOMPEL EDWIN AUGUSTINUS MA

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70716 ,  G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide an improved system and method for evacuating a mixture of liquid and gas from components in a lithographic apparatus. SOLUTION: The lithographic apparatus includes a liquid supply system configured to fill a space between a projection system and a substrate with a liquid, an outlet configured to remove a mixture of liquid and gas passing through a gap between a liquid confinement structure of the liquid supply system and the substrate, and an evacuation system configured to draw the mixture through the outlet, wherein the evacuation system has a separator tank arranged to separate liquid from gas in the mixture and a separator tank pressure controller, connected to a non-liquid-filled region of the separator tank, configured to maintain stable pressure within the non-liquid-filled region. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供一种用于从光刻设备中的组件抽空液体和气体的混合物的改进的系统和方法。 解决方案：光刻设备包括液体供应系统，其配置成用液体填充投影系统和基底之间的空间，出口构造成去除液体和气体的混合物，其通过液体和液体的液体限制结构之间的间隙 所述液体供应系统和所述基板以及被配置为通过所述出口抽吸所述混合物的抽空系统，其中所述抽空系统具有布置成将液体与所述混合物中的气体分离的分离器罐和分离器箱压力控制器， 分离罐的充满液体的区域，被配置为在非液体填充区域内保持稳定的压力。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：WO2006084641A2

公开(公告)日：2006-08-17

申请号：PCT/EP2006001005

申请日：2006-02-06

Applicant: ASML NETHERLANDS BV ,  JANSEN HANS ,  STAVENGA MARCO KOERT ,  VERSPAY JACOBUS JOHANNUS LEONA ,  JANSSEN FRANCISCUS JOHANNES JO ,  KUIJPER ANTHONIE

Inventor： JANSEN HANS ,  STAVENGA MARCO KOERT ,  VERSPAY JACOBUS JOHANNUS LEONA ,  JANSSEN FRANCISCUS JOHANNES JO ,  KUIJPER ANTHONIE

IPC: G03F7/20

CPC classification number: G03F7/70858 ,  G03F7/2041 ,  G03F7/70341

Abstract: An immersion liquid is provided comprising an ion-forming component, e.g. an acid or a base, that has a relatively high vapor pressure. Also provided are lithography processes and lithography systems using the immersion liquid.

Abstract translation: 提供了一种浸没液体，其包括离子形成组分，例如 酸或碱，具有较高的蒸气压。 还提供了使用浸液的光刻工艺和光刻系统。

公开(公告)号：SG121969A1

公开(公告)日：2006-05-26

申请号：SG200506523

申请日：2005-10-13

Applicant: ASML NETHERLANDS BV

Inventor： MERTENS JEROEN JOHANNES SOPHIA ,  DONDERS SJOERD NICOLAAS LAMBER ,  GRAAF DE ROELOF FREDERIK ,  HOOGENDAM CHRISTIAAN ALEXANDER ,  NET VAN DER ANTONIUS JOHANNES ,  TEUNISSEN FRANCISCUS JOHANNES ,  TINNEMANS PATRICIUS ALOYSIUS J ,  VERHAGEN MARTINUS CORNELIS MAR ,  VERSPAY JACOBUS JOHANNUS LEONA ,  GOMPEL VAN EDWIN AUGUSTINUS MA