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    리소그래피 장치 교정 방법
    1.
    发明公开
    리소그래피 장치 교정 방법 审中-公开
    光刻设备校准方法

    公开(公告)号：KR20180006973A

    公开(公告)日：2018-01-19

    申请号：KR20177036104

    申请日：2016-05-27

    Applicant: ASML NETHERLANDS BV

    Inventor： SCHMITT WEAVER EMIL PETER ,  STAECKER JENS ,  SCHREEL KOENRAAD REMI ANDRE MARIA ,  WERKMAN ROY

    IPC: G03F7/20 ,  H01L21/027

    CPC classification number: G03F7/70633 ,  G03F7/705

    Abstract: 제 1 기판(2002)은리소그래피장치에의해복수의제 1 필드(2004)에가해지는교정패턴을갖는다. 추가기판(2006, 2010)은복수의추가필드(2008, 2012)에가해지는교정패턴을갖는다. 복수의다른필드는다른크기및/또는형상및/또는위치를갖는다. 교정측정은패터닝된기판(2002, 2006, 2010)에대해수행되고, 다음기판에제품패턴을가할때 장치를제어하는데에사용되는교정을얻기위해사용된다. 2개이상의다른치수를갖는필드(2004, 2008, 2012)에서장치의성능을나타내는측정데이p타는데이타베이스(2013)에함께수집되고, 새로운크기에대해장치를교정하는데에필요한정보를합성하기위해사용된다. 교정데이타는다른스캔및 스텝방향에대해서도얻어진다.

    Abstract translation: 第一衬底2002具有通过光刻设备应用于多个第一场2004的校准图案。 其他基板2006和2010的校准模式应用于垃圾数量的附加字段2008和2012。 多个不同的区域具有不同的尺寸和/或形状和/或位置。 在图案化衬底2002,2006,2010上执行校准测量并且用于在将产品图案施加到下一个衬底时获得用于控制装置的校准。 具有不同尺寸的字段的至少两个（2004，2008，2012）被一起收集在测量代表该装置的性能数据p乘坐一个数据库（2013），为了合成他们需要的设备校准到新的尺寸的信息 被使用。 校准数据也可以获得不同的扫描和步进方向。

    Substrate alignment for bonding
    2.
    发明专利
    Substrate alignment for bonding 有权
    用于接合的基板对准

    公开(公告)号：JP2007300099A

    公开(公告)日：2007-11-15

    申请号：JP2007111644

    申请日：2007-04-20

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： BIJNEN FRANCISCUS GODEFRIDUS C ,  WERKMAN ROY

    IPC: H05K13/04 ,  B23P19/00

    CPC classification number: H01L21/681 ,  H01L21/67092 ,  Y10T29/49131

    Abstract: PROBLEM TO BE SOLVED: To provide an alignment apparatus for a substrate bonding system. SOLUTION: A primary optical arm 12a configured so that radiation from primary alignment marks 6a and 6b on a primary substrate 6 may be guided to a detector, and a secondary optical arm 12b configured so that radiation from secondary alignment marks 8a and 8b on a secondary substrate 8 may be guided to a detector 28a are arranged. The primary alignment mark has a known position against a functional pattern arranged on the opposite side of the primary substrate, while the secondary alignment mark has a known position against a functional pattern arranged on the opposite side of the secondary substrate. In addition, the substrate bonding system has primary and secondary substrate tables 4 that are configured so that the primary and secondary substrates may be held, and at least one of the substrate tables can move in response to a signal output from the detector. The primary and secondary substrates can be aligned against each other for bonding. COPYRIGHT: (C)2008,JPO&INPIT

    Abstract translation: 要解决的问题：提供一种用于基板接合系统的定位装置。 解决方案：主光学臂12a被配置为使得可以将主基板6上的主对准标记6a和6b的辐射引导到检测器，并且辅助光臂12b被配置为使得来自次对准标记8a和8b的辐射 可以将第二基板8引导到检测器28a。 主对准标记具有相对于布置在主基板的相对侧上的功能图案的已知位置，而第二对准标记具有针对布置在次级基板的相对侧上的功能图案的已知位置。 此外，衬底接合系统具有被配置为使得可以保持初级和次级衬底的初级和次级衬底台4，并且至少一个衬底台可以响应于从检测器输出的信号而移动。 主基板和次基板可以彼此对准以进行接合。 版权所有（C）2008，JPO＆INPIT

    Method for optimizing alignment strategy
    4.
    发明专利
    Method for optimizing alignment strategy 有权
    优化对齐策略的方法

    公开(公告)号：JP2006148112A

    公开(公告)日：2006-06-08

    申请号：JP2005331527

    申请日：2005-11-16

    Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

    Inventor： WERKMAN ROY ,  VAN BILSEN FRANCISCUS B M ,  SWINNEN BART LUC

    IPC: H01L21/027 ,  G03F9/00

    CPC classification number: G03F7/70633 ,  G03F9/7046

    Abstract: PROBLEM TO BE SOLVED: To provide a method for optimizing an alignment strategy that processes batches of substrates in a lithographic projection apparatus.
    SOLUTION: First, all of the substrates in the batches in the lithographic projection apparatus are sequentially aligned using a predefined alignment strategy and exposed (804). Next, alignment data is determined for each substrate in the batches (805). At least one substrate in each batch is selected to obtain a set of selected substrates (806-809). By a metrology tool, overlay data for each of the selected substrates is determined and overlay indicator values for a predefined overlay indicator are calculated (810) for the predefined alignment strategy and for other possible alignment strategies, and an optimal alignment strategy is determined, the strategy being defined as alignment strategy among the predefined alignment strategy and the other possible alignment strategies with a lowest overlay indicator value (811).
    COPYRIGHT: (C)2006,JPO&NCIPI

    Abstract translation: 要解决的问题：提供一种用于优化在光刻投影设备中处理批次的基板的对准策略的方法。 解决方案：首先，使用预定义的对准策略并且曝光（804），顺序地对准光刻投影设备中的批次中的所有基板。 接下来，对于批次中的每个基板（805）确定对准数据。 选择每批中至少一个基质以获得一组选定的底物（806-809）。 通过计量工具，确定每个所选择的基底的覆盖数据，并且为预定义的对准策略和其他可能的对准策略计算预定覆盖指示符的覆盖指标值（810），并且确定最优对准策略， 策略定义为预定义对齐策略中的对齐策略和具有最低重叠指标值的其他可能对齐策略（811）。 版权所有（C）2006，JPO＆NCIPI

    Inspection device, image projector, and substrate characteristic measuring method
    5.
    发明专利
    Inspection device, image projector, and substrate characteristic measuring method 有权
    检测装置，图像投影仪和基板特性测量方法

    公开(公告)号：JP2008085326A

    公开(公告)日：2008-04-10

    申请号：JP2007232149

    申请日：2007-09-07

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： WERKMAN ROY ,  MOS EVERHARDUS CORNELIS ,  SCHAAR MAURITS VAN DER

    IPC: H01L21/027

    CPC classification number: G03F7/70633

    Abstract: PROBLEM TO BE SOLVED: To provide an apparatus capable of improving image quality in a plurality of focal depths.
    SOLUTION: When using a scatterometer, different sections of a target region have different focal depths, respectively, and therefore, when measuring an entire region, a result of the measurement is partially out of a focus. In order to compensate this, a lens array is arranged in a back focal plane of a high numerical aperture lens.
    COPYRIGHT: (C)2008,JPO&INPIT

    Abstract translation: 解决的问题：提供能够提高多个焦点深度的图像质量的装置。 解决方案：当使用散射仪时，目标区域的不同部分分别具有不同的焦深，因此当测量整个区域时，测量结果部分地不在焦点上。 为了补偿这一点，在高数值孔径透镜的后焦平面上布置透镜阵列。 版权所有（C）2008，JPO＆INPIT

    Lithographic apparatus, and method for manufacturing device
    6.
    发明专利
    Lithographic apparatus, and method for manufacturing device 有权
    平面设备和制造设备的方法

    公开(公告)号：JP2007281456A

    公开(公告)日：2007-10-25

    申请号：JP2007083242

    申请日：2007-03-28

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： WERKMAN ROY ,  MOS EVERHARDUS CORNELIS

    IPC: H01L21/027 ,  G03F7/20

    CPC classification number: G03F7/70633 ,  G03F9/7092

    Abstract: PROBLEM TO BE SOLVED: To suppress an extreme misalignment caused by insufficient usable information on positioning in a method for positioning a substrate. SOLUTION: The compensation of the misalignment in the substrate is executed before exposure by using a compensation value and a process compensation value calculated based on the positioning offset measured value of a positioning mark present on a substrate and the overlay measured value of an overlay target in the preceding batch. Fluctuations in overlays of the positioning mark are measured on at least one substrate in the preceding batch and overlay fluctuations with weights are all totalled on the positioning mark of at least one substrate in the preceding batch to calculate a process compensation of the substrate, and the process compensation is applied to the positioning of the substrate and the substrate is exposed. COPYRIGHT: (C)2008,JPO&INPIT

    Abstract translation: 要解决的问题：为了抑制由于在用于定位基板的方法中的定位的不充分的可用信息引起的极大的未对准。 解决方案：通过使用补偿值和基于存在于基板上的定位标记的定位偏移测量值计算的过程补偿值，在曝光之前执行基板中的未对准的补偿，以及基板的重叠测量值 上一批中的覆盖目标。 定位标记的叠层中的波动在前一批次中的至少一个基板上测量，并且具有重量的重叠波动全部在前一批次中的至少一个基板的定位标记上，以计算基板的工艺补偿，并且 对基板的定位进行过程补偿，并且暴露基板。 版权所有（C）2008，JPO＆INPIT

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