公开(公告)号：NL2008609A

公开(公告)日：2012-05-24

申请号：NL2008609

申请日：2012-04-05

Applicant: ASML NETHERLANDS BV

Inventor： CORNELISSEN SEBASTIAAN ,  GILISSEN NOUD ,  SIJBEN ANKO ,  NOTENBOOM ARNOUD ,  WILK RONALD

IPC: G03F7/20 ,  H01L21/687

公开(公告)号：NL2012204A

公开(公告)日：2014-12-18

申请号：NL2012204

申请日：2014-02-05

Applicant: ASML HOLDING NV ,  ASML NETHERLANDS BV

Inventor： DEL PUERTO SANTIAGO ,  LIPSON MATTHEW ,  HENDERSON KENNETH ,  LAFARRE RAYMOND ,  MARKOYA LOUIS ,  VERMEULEN JOHANNES ,  GROOT ANTONIUS FRANCISCUS JOHANNES ,  WILK RONALD

IPC: G03F7/20

Abstract: A lithographic apparatus is provided. The lithographic apparatus includes a reticle and an electrostatic clamp configured to releasably hold the reticle. The electrostatic clamp includes a first substrate having opposing first and second surfaces, a plurality of burls located on the first surface and configured to contact the reticle, a second substrate having opposing first and second surfaces. The first surface of the second substrate is coupled to the second surface of the first substrate. A plurality of cooling elements are located between the first surface of the second substrate and the second surface of the first substrate. The cooling elements are configured to cause electrons to travel from the second surface of the first substrate to the first surface of the second substrate. Each cooling element is substantially aligned with a respective burl.

公开(公告)号：NL2013676A

公开(公告)日：2015-08-17

申请号：NL2013676

申请日：2014-10-24

Applicant: ASML NETHERLANDS BV

Inventor： WILK RONALD

IPC: G03F7/20 ,  H01L21/687

公开(公告)号：NL2013552A

公开(公告)日：2014-12-01

申请号：NL2013552

申请日：2014-10-01

Applicant: ASML NETHERLANDS BV

Inventor： WILK RONALD ,  GOORHUIS GER-WIM JAN

IPC: G03F7/20

公开(公告)号：NL2010481A

公开(公告)日：2013-10-28

申请号：NL2010481

申请日：2013-03-19

Applicant: ASML NETHERLANDS BV

Inventor： WILK RONALD ,  SCHMITZ ROGER ,  NOTENBOOM ARNOUD ,  WILL MANON ELISE

IPC: G03F7/20 ,  H01L21/687