PLASMA SOURCE HAVING SUPPLEMENTAL ENERGIZER FOR ION ENHANCEMENT
    1.
    发明申请
    PLASMA SOURCE HAVING SUPPLEMENTAL ENERGIZER FOR ION ENHANCEMENT 审中-公开
    具有补充能源的等离子体源用于离子增强

    公开(公告)号:WO02082491A3

    公开(公告)日:2002-12-05

    申请号:PCT/US0210335

    申请日:2002-04-04

    CPC classification number: H01J37/32192 H01J37/321

    Abstract: A supplemental ion source (74) for a plasma processing system (10) having a plasma processing chamber (16) is provided. The ion source (74) comprises: a signal generator (82, 96) for generating an output signal; and an antenna assembly (76, 90) located proximate the process chamber (16), whereby energization of the antenna assembly by the signal generator ionizes plasma confined within the processing chamber (16) to create plasma having a substantial ionized content. The antenna assembly (76, 90) is generally planar in shape and may take the form of a plate or coil antenna. The signal generator preferably generates an output signal in the radio frequency (RF) range. The supplemental energizer operates independently of the first plasma source such that either, or both, may be switched on or off at any time.

    Abstract translation: 提供了一种用于具有等离子体处理室(16)的等离子体处理系统(10)的补充离子源(74)。 离子源(74)包括:用于产生输出信号的信号发生器(82,96); 以及位于处理室(16)附近的天线组件(76,90),由此由信号发生器对天线组件的通电电离了处理室(16)内限制的等离子体,以产生具有基本电离含量的等离子体。 天线组件(76,90)的形状大体上是平面的并且可以采取板或线圈天线的形式。 信号发生器优选地在射频(RF)范围内产生输出信号。 辅助增能器独立于第一等离子体源操作,使得任一个或两者可以在任何时间被打开或关闭。

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