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公开(公告)号:DE2909158A1
公开(公告)日:1980-09-11
申请号:DE2909158
申请日:1979-03-08
Applicant: BASF AG
IPC: A01N47/10 , A01N25/04 , A01N25/22 , A01N33/04 , A01N33/18 , A01N37/22 , A01N43/58 , A01N47/12 , A01N47/18 , A01P13/00 , A01N9/02
Abstract: Herbicides based on an aqueous suspension of from 20 to 50 percent by weight of 1-phenyl-4-amino-5-chloro-pyridaz-6-one or 1-phenyl-4-amino-5-bromo-pyridaz-6-one, from 2 to 10 percent by weight of dispersant, from 0.5 to 5 percent by weight of silica and from 0.5 to 5 percent by weight of a block polymer of propylene glycol, propylene oxide and ethylene oxide, which additionally contain a thiolcarbamate, a chloroacetanilide or a 2,6-dinitroaniline, the weight ratio of pyridazone to thiolcarbamate, chloroacetanilide or 2,6-dinitroaniline being from 4:1 to 1:2, a process for their preparation, and their use for combating undesired plant growth.
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公开(公告)号:DE3039770A1
公开(公告)日:1982-05-27
申请号:DE3039770
申请日:1980-10-22
Applicant: BASF AG
Inventor: KLEUSER DIETER DIPL CHEM DR , OPPENLAENDER KNUT DIPL CHEM DR , KRAPF HEINZ DIPL CHEM DR , STORK KARL DIPL CHEM DR , STRICKLER RAINER DIPL CHEM DR , FAULHABER GERHARD DIPL CHEM DR
Abstract: 1. The use of a compound of the formula I see diagramm : EP0050228,P9,F6 where R**1 and R**2 are identical or different and each is see diagramm : EP0050228,P9,F7 see diagramm : EP0050228,P9,F8 -O-alpha-naphthyl or O-beta-naphthyl, where R**4 , R**5 and R**6 are identical or different and each is H, C1 -C12 -alkyl or C7 -C10 -aralkyl, and R**7 is hydrogen or methyl and R**3 is a radical of the formula II or III -(C2 H4 O)n (C3 H6 O)m H -(C3 H6 O)m (C2 H4 O)n H, where n is a number from 0 to 50 and m is a number from 0 to 50, with the proviso that m or n is 5 or more, as a non-ionic oil-in-water emulsifier component for crop protection formulations.
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公开(公告)号:DE3027959A1
公开(公告)日:1982-03-04
申请号:DE3027959
申请日:1980-07-24
Applicant: BASF AG
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公开(公告)号:DE3039209A1
公开(公告)日:1982-05-19
申请号:DE3039209
申请日:1980-10-17
Applicant: BASF AG
Abstract: Photopolymer relief plates are produced by applying a photopolymerizable relief-forming layer R, which contains a thermal polymerization inhibitor liberating nitrosyl free radicals on ultraviolet irradiation, to a dimensionally stable base which bears an adhesive layer A for the layer R, the layer A containing 0.01 to 10 percent by weight of a compound where R1, R2, R3 and R4 are identical or different and each is alkyl or R5-(O-alkylene)x-, R5 being H or alkyl and x being 1, 2, 3, 4 or 5, and then exposing, and developing, the layer R in a conventional manner.
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公开(公告)号:DE2720560A1
公开(公告)日:1978-11-09
申请号:DE2720560
申请日:1977-05-07
Applicant: BASF AG
Inventor: HOFFMANN GERHARD DIPL CHEM DR , KLEUSER DIETER DIPL CHEM DR , BRONSTERT BERND DIPL CHEM DR
Abstract: Photopolymerizable compositions for the production of printing plates and relief plates, consisting essentially of a photoinitiator-containing mixture of olefinically unsaturated photopolymerizable compounds with polymeric binders, contain up to 1% by weight of a compound having the structural element of anthrone, e.g. bianthrone and 9,9'-bianthryl, which results in an improved relief image in the production of relief plates.
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