3.
    发明专利
    未知

    公开(公告)号:DE3039209A1

    公开(公告)日:1982-05-19

    申请号:DE3039209

    申请日:1980-10-17

    Applicant: BASF AG

    Abstract: Photopolymer relief plates are produced by applying a photopolymerizable relief-forming layer R, which contains a thermal polymerization inhibitor liberating nitrosyl free radicals on ultraviolet irradiation, to a dimensionally stable base which bears an adhesive layer A for the layer R, the layer A containing 0.01 to 10 percent by weight of a compound where R1, R2, R3 and R4 are identical or different and each is alkyl or R5-(O-alkylene)x-, R5 being H or alkyl and x being 1, 2, 3, 4 or 5, and then exposing, and developing, the layer R in a conventional manner.

    6.
    发明专利
    未知

    公开(公告)号:DE3015340A1

    公开(公告)日:1981-10-29

    申请号:DE3015340

    申请日:1980-04-22

    Applicant: BASF AG

    Abstract: A laminate suitable for the production of printing plates and relief plates, and possessing a photosensitive layer, which is soluble in water or in an aqueous solution, and contains a hydrophilic polymeric binder, applied to a base, contains, between the base and the photosensitive layer, an intermediate layer which consists of a mixture of a polymeric binder compatible with the polymeric binder of the photosensitive layer, and a diacrylate or dimethacrylate monomer which contains urethane groups and is obtained by reacting a hydroxyalkyl acrylate or hydroxyalkyl methacrylate with a diisocyanate. After application to the base, the intermediate layer is cured at 110 DEG -220 DEG C. before the photosensitive layer is applied.

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