公开(公告)号：SG11201600360YA

公开(公告)日：2016-02-26

申请号：SG11201600360Y

申请日：2014-07-08

Applicant: BASF SE

Inventor： LAUTER MICHAEL ,  LI YUZHUO ,  NOLLER BASTIAN MARTEN ,  LANGE ROLAND ,  REICHARDT ROBERT ,  LAN YONGQING ,  BOYKO VOLODYMYR ,  KRAUS ALEXANDER ,  SEYERL JOACHIM VON ,  USMAN IBRAHIM SHEIK ANSAR ,  SIEBERT MAX ,  HARTNAGEL KRISTINE ,  DENGLER JOACHIM ,  HILLESHEIM NINA SUSANNE

IPC: C09G1/02 ,  C09G1/00 ,  C09G1/04 ,  C09K3/14

Abstract: Described is a chemical-mechanical polishing (CMP) composition comprising abrasive particles containing ceria.