5.
    发明专利
    未知

    公开(公告)号:DE602006012067D1

    公开(公告)日:2010-03-18

    申请号:DE602006012067

    申请日:2006-09-11

    Applicant: BASF SE

    Abstract: The invention also relates to a method for stain resistance and penetration resistance of aqueous coating compositions which method comprises providing a coating composition which contain at least one pigment, at least one film-forming polymer in the form of an aqeuous polymer dispersion and at least one anionic surfactant, wherein the anionic surfactant comprises at least 85 % by weight, preferably at least 90 % by weight, more preferably at least 95 % by weight, based on the total weight of anionic surfactant in the coating composition, of at least one anionic surfactant S, which is selected from semi-esters of sulfuric acid or phosphoric acid with an alcohol, which alcohol carries at least one alkyl radical having from 8 to 30 carbon atoms or an alkyl substituted phenyl radical wherein alkyl has from 4 to 30 carbon atoms and which alcohol may carry an oligo-C 2 -C 3 -alkylene-ether group provided that the number of repeating units in the oligo-C 2 -C 3 -alkylene-ether group is at most 15, or a salt thereof.

    7.
    发明专利
    未知

    公开(公告)号:AT456635T

    公开(公告)日:2010-02-15

    申请号:AT06793397

    申请日:2006-09-11

    Applicant: BASF SE

    Abstract: The invention also relates to a method for stain resistance and penetration resistance of aqueous coating compositions which method comprises providing a coating composition which contain at least one pigment, at least one film-forming polymer in the form of an aqeuous polymer dispersion and at least one anionic surfactant, wherein the anionic surfactant comprises at least 85 % by weight, preferably at least 90 % by weight, more preferably at least 95 % by weight, based on the total weight of anionic surfactant in the coating composition, of at least one anionic surfactant S, which is selected from semi-esters of sulfuric acid or phosphoric acid with an alcohol, which alcohol carries at least one alkyl radical having from 8 to 30 carbon atoms or an alkyl substituted phenyl radical wherein alkyl has from 4 to 30 carbon atoms and which alcohol may carry an oligo-C 2 -C 3 -alkylene-ether group provided that the number of repeating units in the oligo-C 2 -C 3 -alkylene-ether group is at most 15, or a salt thereof.

    8.
    发明专利
    未知

    公开(公告)号:DE502004010595D1

    公开(公告)日:2010-02-11

    申请号:DE502004010595

    申请日:2004-09-10

    Applicant: BASF SE

    Abstract: Sulfonamides of the formula I where the substituents are as follows: R 1 is hydrogen, alkyl, alkoxy, alkenyl or alkynyl; and R 2 , R 3 , R 4 , R 5 are hydrogen, halogen, alkyl, alkoxy or halomethyl; R 2 and R 3 together may also form a phenyl, cyclopentyl or cyclohexyl ring, it being possible for these rings to carry two groups R 2 ' and R 3 ', R 2 ', R 3 ' are hydrogen, halogen, alkyl, alkoxy or halomethyl; in case a), if R 2 , R 3 , R 4 and R 5 are hydrogen: X is phenyl substituted by a group C(R 6 )-NOR 7 , where R 6 is alkyl and R 7 is alkyl, benzyl, alkenyl, haloalkyl, haloalkenyl, alkynyl or haloalkynyl; and in case b), if at least one of the groups R 2 , R 3 , R 4 and R 5 is not hydrogen: X is phenyl, naphthyl or a five- or six-membered saturated, or partially unsaturated or aromatic heterocycle which is attached via a carbon atom and contains one to four heteroatoms from the group consisting of O, N and S, where X may be substituted according to the description; Processes for preparing these compounds, compositions comprising them and their use for controlling phytopathogenic harmful fungi.

    10.
    发明专利
    未知

    公开(公告)号:AT443990T

    公开(公告)日:2009-10-15

    申请号:AT03725066

    申请日:2003-04-22

    Applicant: BASF SE

    Abstract: 3-Heteroaryl-substituted isoxazolines of the formula I where: X is substituted 5-membered heteroaryl having one to four nitrogen atoms or one to three nitrogen atoms and one oxygen or sulfur atom or one oxygen or sulfur atom; or substituted 6-membered heteroaryl having one to four nitrogen atoms; where the abovementioned 5-membered heteroaryl is not pyrazolyl or thienyl; R 1 -R 7 are hydrogen, alkyl or haloalkyl; Y is unsubstituted or substituted aryl, or benzo[1,4]dioxonyl, benzo[1,3]dioxolanyl, 2,3-dihydrobenzofuranyl or benzimidazole; or unsubstituted or substituted 5- to 6-membered heteroaryl; and their agriculturally useful salts, processes and intermediates for their preparation, and the use of these compounds or of the compositions comprising these compounds for controlling unwanted plants are described.

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