公开(公告)号：JP2012188671A

公开(公告)日：2012-10-04

申请号：JP2012106641

申请日：2012-05-08

Applicant: Brewer Science Inc ,  ブルーワー サイエンス アイ エヌ シー.

Inventor： GUERRERO DOUGLAS J ,  COX ROBERT C ,  WEIMER MARC W

IPC: C08L101/02 ,  C07C43/166 ,  C08K5/06 ,  G03C1/492 ,  G03C1/494 ,  G03F7/039 ,  G03F7/09 ,  G03F7/11 ,  H01L21/027

CPC classification number: G03F7/091 ,  C07C43/166 ,  G03F7/039 ,  G03F7/0392 ,  G03F7/094 ,  G03F7/11 ,  G03F7/168 ,  G03F7/40 ,  Y10S438/952 ,  Y10T428/31667 ,  Y10T428/31699 ,  Y10T428/31935

Abstract: PROBLEM TO BE SOLVED: To provide novel, wet developable anti-reflective coating compositions; and to provide methods of using those compositions.SOLUTION: The compositions comprise a polymer and/or oligomer having acid functional groups and dissolved in a solvent system along with a crosslinker and a photoacid generator. The acid functional group is a carboxylic acid, while the crosslinker is a vinyl ether crosslinker. In use, the compositions are applied to a substrate and thermally crosslinked. Upon exposure to light, the cured compositions will decrosslink, rendering them soluble in typical photoresist developing solutions (e.g., alkaline developers).

Abstract translation: 要解决的问题：提供新的，湿显影的抗反射涂层组合物; 并提供使用这些组合物的方法。 解决方案：组合物包含具有酸官能团的聚合物和/或低聚物，并与交联剂和光酸产生剂一起溶解在溶剂体系中。 酸官能团是羧酸，而交联剂是乙烯基醚交联剂。 在使用中，将组合物施加到基底上并进行热交联。 曝光时，固化的组合物将脱链，使其溶于典型的光致抗蚀剂显影溶液（例如碱性显影剂）中。 版权所有（C）2013，JPO＆INPIT

公开(公告)号：WO2005111719A3

公开(公告)日：2006-11-09

申请号：PCT/US2005012851

申请日：2005-04-15

Applicant: BREWER SCIENCE INC ,  GUERRERO DOUGLAS J ,  COX ROBERT C ,  WEIMER MARC W

Inventor： GUERRERO DOUGLAS J ,  COX ROBERT C ,  WEIMER MARC W

IPC: G03F7/095 ,  C07C43/166 ,  C08J3/24 ,  C08J3/28 ,  C08J5/18 ,  G03C1/492 ,  G03C1/494 ,  G03F7/039 ,  G03F7/09 ,  G03F7/11

CPC classification number: G03F7/091 ,  C07C43/166 ,  G03F7/039 ,  G03F7/0392 ,  G03F7/094 ,  G03F7/11 ,  G03F7/168 ,  G03F7/40 ,  Y10S438/952 ,  Y10T428/31667 ,  Y10T428/31699 ,  Y10T428/31935

Abstract: Novel, wet developable anti-reflective coating compositions and methods of using those compositions are provided. The compositions comprise a polymer and/or oligomer having acid functional groups and dissolved in a solvent system along with a crosslinker and a photoacid generator. The preferred acid functional group is a carboxylic acid, while the preferred crosslinker is a vinyl ether crosslinker. In use, the compositions are applied to a substrate and thermally crosslinked. Upon exposure to light, the cured compositions will decrosslink, rendering them soluble in typical photoresist developing solutions (e.g., alkaline developers).

Abstract translation: 提供了新型的湿显影抗反射涂层组合物和使用这些组合物的方法。 组合物包含具有酸官能团并且与交联剂和光酸产生剂一起溶解在溶剂体系中的聚合物和/或低聚物。 优选的酸官能团是羧酸，而优选的交联剂是乙烯基醚交联剂。 在使用中，将组合物施加到基底上并进行热交联。 曝光时，固化的组合物将脱链，使其溶于典型的光致抗蚀剂显影溶液（例如碱性显影剂）中。

公开(公告)号：EP1743219A4

公开(公告)日：2010-04-28

申请号：EP05771626

申请日：2005-04-15

Applicant: BREWER SCIENCE INC

Inventor： GUERRERO DOUGLAS J ,  COX ROBERT C ,  WEIMER MARC W

IPC: G03F7/095 ,  C07C43/166 ,  C08J3/24 ,  C08J3/28 ,  C08J5/18 ,  G03C1/492 ,  G03C1/494 ,  G03F7/039 ,  G03F7/09 ,  G03F7/11

CPC classification number: G03F7/091 ,  C07C43/166 ,  G03F7/039 ,  G03F7/0392 ,  G03F7/094 ,  G03F7/11 ,  G03F7/168 ,  G03F7/40 ,  Y10S438/952 ,  Y10T428/31667 ,  Y10T428/31699 ,  Y10T428/31935

公开(公告)号：EP2839341A4

公开(公告)日：2015-11-25

申请号：EP13778282

申请日：2013-04-15

Applicant: BREWER SCIENCE INC

Inventor： WANG YUBAO ,  HOCKEY MARY ANN ,  GUERRERO DOUGLAS J ,  KRISHNAMURTHY VANDANA ,  COX ROBERT C

IPC: H01L21/033 ,  B81C1/00 ,  G03F7/00 ,  H01L21/311

CPC classification number: B81C1/0038 ,  B81B1/00 ,  B81C1/00031 ,  B81C2201/0149 ,  G03F7/0002 ,  G03F7/26 ,  H01L21/02126 ,  H01L21/02216 ,  H01L21/02282 ,  H01L21/0332 ,  H01L21/0337 ,  H01L21/31144 ,  Y10T428/24612 ,  Y10T428/24802

Abstract: Compositions for directed self-assembly patterning techniques are provided which avoid the need for separate anti-reflective coatings and brush neutral layers in the process. Methods for directed self-assembly are also provided in which a self-assembling material, such as a directed self-assembly block copolymer, can be applied directly to the silicon hardmask neutral layer and then self-assembled to form the desired pattern. Directed self-assembly patterned structures are also disclosed herein.