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公开(公告)号：JPH0559199A
公开(公告)日：1993-03-09
申请号：JP3630992
申请日：1992-02-24
Applicant: BASF AG
Inventor： PEETAA HESERU , GEERUHARUTO HOFUMAN , TOOMASU BUYUNSHIYU , YURUGEN RANGEN
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公开(公告)号：JPH0416108B2
公开(公告)日：1992-03-23
申请号：JP13742484
申请日：1984-07-04
Applicant: BASF AG
Inventor： GEERUHARUTO HOFUMAN , PEETAA NOIMAN
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公开(公告)号：JPH0326383B2
公开(公告)日：1991-04-10
申请号：JP4302582
申请日：1982-03-19
Applicant: BASF AG
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公开(公告)号：JPH02181150A
公开(公告)日：1990-07-13
申请号：JP27876689
申请日：1989-10-27
Applicant: BASF AG
Inventor： ZON GUIENNKIMU , GEERUHARUTO HOFUMAN , RAINHORUTO SHIYUBUARUMU , HORUSUTO BINDAA
IPC: G03F7/039 , C08F4/00 , G03F7/004 , H01L21/027 , H01L21/30
Abstract: PURPOSE: To obtain a radiation sensitive system by adding a specified β-ketoacid ester as a compd. to inhibit a binder from dissolving in an alkali soln. CONSTITUTION: This mixture consists of a binder or a binder mixture which is insoluble with water but soluble with an alkali soln., a compd. which produces strong acid by irradiation, and an org. compd. which inhibits dissolution of the hinder or the hinder mixture in an alkali soln. The org. compd. is a β- ketoacid ester expressed by formula I. In formula I, R is an alkyl, cycloalkyl, aralkyl group or oxygen-contg. heteroring residue, R and R are hydrogen, halogens, alkyl, cycloalkyl, aralkyl groups, etc., and R and R or R and R may form a ring with -(CH2 )n , wherein (n) is 2 to 5. R is an alkyl, cycloalkyl, aryl group or -CH2 -CO-OR . Thereby, a system having sensitivity with radiation can be obtd. and the reproducibility and resolution can be improved.
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公开(公告)号：JPS63317501A
公开(公告)日：1988-12-26
申请号：JP13453388
申请日：1988-06-02
Applicant: BASF AG
Inventor： GEERUHARUTO HOFUMAN , BUORUFUGANGU HIYUMAA , HORUSUTO KOTSUHO , DEIITAA RITOMAN
IPC: C08F8/00 , C08F2/48 , C08F8/44 , C08F290/00 , C08F299/00
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Patent Agency Ranking
公开(公告)号：JPS59147347A
公开(公告)日：1984-08-23
申请号：JP24498483
申请日：1983-12-27
Applicant: Basf Ag
Inventor： BERUNTO BURONSUTERUTO , GEERUHARUTO HOFUMAN , YOON RINHI
CPC classification number: G03F7/105 , G03F7/031 , Y10S430/116 , Y10S430/121 , Y10S430/123
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7.发明专利Layer of photopolymerizing mixture for manufacturing relief plate and printing plate 失效用于制造缓冲板和印刷板的光聚合混合物层
公开(公告)号：JPS59135458A
公开(公告)日：1984-08-03
申请号：JP24563283
申请日：1983-12-28
Applicant: Basf Ag
Inventor： BERUNTO PURONSUTERUTO , GEERUHARUTO HOFUMAN , YOON RINHI
CPC classification number: G03F7/105
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公开(公告)号：JPS57185042A
公开(公告)日：1982-11-15
申请号：JP4302882
申请日：1982-03-19
Applicant: BASF AG
Inventor： GEERUHARUTO HOFUMAN , PEETAA NOIMAN
IPC: C07D209/46 , C07D209/50 , G03G5/06
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