DUST REMOVING DEVICE AND IMAGING DEVICE
    1.
    发明申请
    DUST REMOVING DEVICE AND IMAGING DEVICE 审中-公开
    除尘装置和成像装置

    公开(公告)号:WO2013058410A3

    公开(公告)日:2013-08-01

    申请号:PCT/JP2012077666

    申请日:2012-10-19

    Applicant: CANON KK

    Abstract: Provided is a dust removing device (470) and an imaging device using the dust removing device (470). In a dust removing device (470) to be set on a base (501), including a piezoelectric element (430) formed of a piezoelectric material (431) and a pair of opposing electrodes (432, 433), a vibration member, and a fixation member containing at least a high molecular compound component, a phase transition temperature T from a first ferroelectric crystal phase to a second ferroelectric crystal phase of the piezoelectric material (431) is set to -60°C

    Abstract translation: 提供了一种除尘装置(470)和使用该除尘装置(470)的成像装置。 在设置在包括由压电材料(431)和一对相对电极(432,433)形成的压电元件(430)的基座(501)上的除尘装置(470),振动部件 至少包含高分子化合物成分的固定部件,压电材料(431)的从第一铁电晶相到第二铁电晶相的相变温度T被设定为-60℃≤T≤-5 ℃,因此,可以适当地设计和控制除尘装置(470),即使在低温下也可以获得高的除尘性能。

    DUST REMOVING DEVICE AND IMAGING DEVICE
    6.
    发明申请
    DUST REMOVING DEVICE AND IMAGING DEVICE 审中-公开
    除尘装置和成像装置

    公开(公告)号:WO2013058410A4

    公开(公告)日:2013-09-19

    申请号:PCT/JP2012077666

    申请日:2012-10-19

    Applicant: CANON KK

    Abstract: Provided is a dust removing device (470) and an imaging device using the dust removing device (470). In a dust removing device (470) to be set on a base (501), including a piezoelectric element (430) formed of a piezoelectric material (431) and a pair of opposing electrodes (432, 433), a vibration member, and a fixation member containing at least a high molecular compound component, a phase transition temperature T from a first ferroelectric crystal phase to a second ferroelectric crystal phase of the piezoelectric material (431) is set to -60°C

    Abstract translation: 提供了除尘装置(470)和使用除尘装置(470)的成像装置。 在设置在基体(501)上的除尘装置(470)中,包括由压电材料(431)和一对相对电极(432,483)形成的压电元件(430),振动部件 含有至少高分子化合物成分的固定构件,从压电材料(431)的第一铁电晶体相到第二铁电晶体相的相变温度T被设定为-60℃<= T <= -5 ℃,从而可以适当地设计和控制除尘装置(470),即使在低温下也可以获得高的除尘性能。

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