公开(公告)号：JP2000214092A

公开(公告)日：2000-08-04

申请号：JP2000007613

申请日：2000-01-17

Applicant: CIT ALCATEL

Inventor： CHEVALIER ERIC ,  MAQUIN PHILIPPE ,  ROLLAND BERNARD

IPC: C23C16/52 ,  G01N21/68 ,  G01N21/73

Abstract: PROBLEM TO BE SOLVED: To provide a gas analysis system which is provided with a device used to ionize a gas to be analyzed, which is provided with a device used to analyze the ionized gas, and by which a gas inside an enclosure is analyzed under a controlled pressure. SOLUTION: As a device 2 and a device 6 which ionize a gas to be analyzed, a dedicated plasma source 2 coupled to a generator 6 which comes into contact with a gas contained inside an enclosure 3 and which generates a plasma from the gas to be analyzed is provided. Then, as a device 4 and a device 5 which analyze the ionized gas, a radiation sensor 4 connected to a spectrometer 5 which is situated near a region used to generate the plasma and which analyzes a change in a radiation spectrum emitted by the generated plasma is provided.

公开(公告)号：FR2792083A1

公开(公告)日：2000-10-13

申请号：FR9904539

申请日：1999-04-12

Applicant: CIT ALCATEL

Inventor： ROUSSEAU CLAUDE ,  PILOTTI PATRICK ,  MAQUIN PHILIPPE

IPC: F04B49/06 ,  F04D27/02 ,  G05D16/20 ,  F04C29/10 ,  F04C25/02 ,  F04D23/00 ,  F04D27/00

Abstract: The pressure regulation system for a vacuum chamber (1), connected by pipes to a pump unit (3) with a primary mechanical dry pump (4) and a secondary pump (5), has a speed controller (6) simultaneously setting speed of the primary and secondary pumps. The speed controller uses predetermined speed profiles (20) computed from condensation curves for effluents contained in the chamber and pipes.

公开(公告)号：FR2788854A1

公开(公告)日：2000-07-28

申请号：FR9900723

申请日：1999-01-22

Applicant: CIT ALCATEL

Inventor： CHEVALIER ERIC ,  MAQUIN PHILIPPE ,  BERNARD ROLAND

IPC: C23C16/52 ,  G01N21/68 ,  G01N21/73 ,  G01N21/62 ,  G01N33/00 ,  H05H1/46

公开(公告)号：FR2863103A1

公开(公告)日：2005-06-03

申请号：FR0314176

申请日：2003-12-01

Applicant: CIT ALCATEL

Inventor： MAQUIN PHILIPPE ,  NEEL THIERRY ,  BERNARD ROLAND

IPC: H05H1/00 ,  B01D53/34 ,  B01D53/38 ,  B01D53/70 ,  B01J3/02 ,  C23C16/44 ,  H01J37/32 ,  H01L21/31 ,  H05H1/46 ,  H05H1/24

Abstract: The system includes a pumping assembly (2) with a vacuum pump body having multiple pumping stages (5-9), and a pumped gas treatment system. The pumped gas treatment system has plasma sources (15, 16) housed inside the vacuum pump body of the pumping assembly for generating plasma that decomposes partly some gas traversing the pumping assembly.

公开(公告)号：AT280406T

公开(公告)日：2004-11-15

申请号：AT00400956

申请日：2000-04-07

Applicant: CIT ALCATEL

Inventor： ROUSSEAU CLAUDE ,  PILOTTI PATRICK ,  MAQUIN PHILIPPE

IPC: F04C18/18 ,  F04B49/06 ,  F04C25/02 ,  F04D27/02 ,  G05D16/20 ,  F04B37/08

Abstract: The invention concerns a system for regulating pressure in a chamber (1) containing effluents, connected by pipes (2) to a pumping unit (3) comprising a self-lubricating mechanical primary pump (4) and at least a secondary pump (5). The invention is characterised in that the system comprises a speed regulator (6) controlling simultaneously the rotation speeds of the self-lubricating mechanical primary pump (4) and of the secondary pump (5).

公开(公告)号：FR2863103B1

公开(公告)日：2006-07-14

申请号：FR0314176

申请日：2003-12-01

Applicant: CIT ALCATEL

Inventor： MAQUIN PHILIPPE ,  NEEL THIERRY ,  BERNARD ROLAND

IPC: H01J37/32 ,  H05H1/00 ,  B01D53/34 ,  B01D53/38 ,  B01D53/70 ,  B01J3/02 ,  C23C16/44 ,  H01L21/00 ,  H01L21/31 ,  H05H1/24 ,  H05H1/46

Abstract: The system includes a pumping assembly (2) with a vacuum pump body having multiple pumping stages (5-9), and a pumped gas treatment system. The pumped gas treatment system has plasma sources (15, 16) housed inside the vacuum pump body of the pumping assembly for generating plasma that decomposes partly some gas traversing the pumping assembly.

公开(公告)号：FR2792083B1

公开(公告)日：2003-08-01

申请号：FR9904539

申请日：1999-04-12

Applicant: CIT ALCATEL

Inventor： ROUSSEAU CLAUDE ,  PILOTTI PATRICK ,  MAQUIN PHILIPPE

IPC: F04B49/06 ,  F04D27/02 ,  G05D16/20 ,  F04C29/10 ,  F04C25/02 ,  F04D23/00 ,  F04D27/00

Abstract: The pressure regulation system for a vacuum chamber (1), connected by pipes to a pump unit (3) with a primary mechanical dry pump (4) and a secondary pump (5), has a speed controller (6) simultaneously setting speed of the primary and secondary pumps. The speed controller uses predetermined speed profiles (20) computed from condensation curves for effluents contained in the chamber and pipes.

公开(公告)号：FR2788854B1

公开(公告)日：2001-05-04

申请号：FR9900723

申请日：1999-01-22

Applicant: CIT ALCATEL

Inventor： CHEVALIER ERIC ,  MAQUIN PHILIPPE ,  BERNARD ROLAND

IPC: C23C16/52 ,  G01N21/68 ,  G01N21/73 ,  G01N21/62 ,  G01N33/00 ,  H05H1/46