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    COATING CONTAINING SILICONE DIOXIDE
    1.
    发明专利
    COATING CONTAINING SILICONE DIOXIDE 失效

    公开(公告)号：JP2000104017A

    公开(公告)日：2000-04-11

    申请号：JP22194099

    申请日：1999-08-05

    Applicant: DOW CORNING

    Inventor： CHANDRA GRISH ,  HALUSKA LOREN ANDREW

    IPC: B05D5/00 ,  B05D3/02 ,  B05D7/24 ,  C09D183/16 ,  H01L21/316

    Abstract: PROBLEM TO BE SOLVED: To form a coating containing silicone dioxide without damaging a substrate by painting a coating composition containing a polysilastyrene on the substrate and then forming a coating containing silicone dioxide through heating in an oxidative atmosphere. SOLUTION: A coating composition is obtained by blending a polysilastyrene having the ratio of the silicone-bonding methyl group to the silicone-bonding phenyl group of 1:1-4:1, a ceramic oxide precursor for reforming, 1-96 wt.% of a filler, 0.01-10 wt.% of a silane coupling agent, 5-1,000 ppm of a catalyst, a flux and 20-99.1 wt.% of a solvent. A coating is formed by stenciling this coating composition on a substrate. Then polysilastyrene is melted and fluidized by heating to a temperature not lower than the melting point of polysilastyrene. Following that, a coating containing silicone dioxide having a thickness of 1-500 μm is formed by heating at 50-1,000 deg.C in an inert atmosphere.

    Coating process
    3.
    发明授权
    Coating process 失效
    涂层工艺

    公开(公告)号：US3928629A

    公开(公告)日：1975-12-23

    申请号：US47924574

    申请日：1974-06-14

    Applicant: DOW CORNING

    Inventor： CHANDRA GRISH ,  ROWLAND COLIN MOSTYN

    IPC: C08F299/00 ,  C08F290/00 ,  C08L83/00 ,  C08L83/04 ,  C08L83/07 ,  C09D183/04 ,  C09J7/02 ,  B05D3/02

    CPC classification number: C08L83/04 ,  C08G77/08 ,  C08G77/12 ,  C08G77/20 ,  C08G77/44 ,  C08G77/70 ,  C08K5/0025 ,  C08L83/00 ,  C08L2666/54 ,  C08L2666/52

    Abstract: Process for coating a surface with an organosiloxane composition to render it non-adherent. The organosiloxane composition is substantially solvent-free, has a viscosity not exceeding 4000 cS at 25*C and comprises (1) a polydiorganosiloxane having siliconbonded vinyl radicals (2) an organohydrogenpolysiloxane and (3) a catalyst which is RhX3(SR2)3 or Rh2(CO)4X2 in which X is halogen, preferably chlorine, and each R is alkyl, aryl, aralkyl, alkaryl or R''3SiQ wherein Q is a divalent aliphatic hydrocarbon radical and R'' is alkyl, aryl, aralkyl or alkaryl or (CH3)3Si-. After application the composition is cured.

    Abstract translation: 用有机硅氧烷组合物涂覆表面以使其不粘附的方法。 有机硅氧烷组合物基本上是无溶剂的，在25℃下的粘度不超过4000cS，包括（1）具有硅键合的乙烯基的聚二有机硅氧烷（2）有机氢聚硅氧烷和（3）RhX3（SR2） 3或Rh2（CO）4X2，其中X是卤素，优选氯，每个R是烷基，芳基，芳烷基，烷芳基或R'3SiQ，其中Q是二价脂族烃基，R'是烷基，芳基，芳烷基或烷芳基 或（CH 3）3 Si-。 施用后，组合物固化。

    Complexes containing sulphur
    4.
    发明授权
    Complexes containing sulphur 失效
    含硫的络合物

    公开(公告)号：US3890359A

    公开(公告)日：1975-06-17

    申请号：US43812374

    申请日：1974-01-30

    Applicant: DOW CORNING

    Inventor： CHANDRA GRISH

    IPC: C07F7/08 ,  C07F15/00

    CPC classification number: C07F15/008 ,  C07F7/0879

    Abstract: Rhodium (III) complexes of the general formula

    Abstract translation: 通式为RhX 3（SR'R“）3的铑（III）络合物，其中每个X表示Cl，Br或I，R'表示R3SiQ-，其中R是烷基，芳基，芳烷基，烷芳基或三甲基甲硅烷基，Q表示 二价脂族烃基，R“表示烷基，芳基，芳烷基，烷芳基或R 3 SiQ-。

    8.
    发明专利
    未知

    公开(公告)号：DE3884892T2

    公开(公告)日：1994-05-05

    申请号：DE3884892

    申请日：1988-08-04

    Applicant: DOW CORNING

    Inventor： CHANDRA GRISH ,  ZANK GREGG ALAN

    IPC: C08G77/00 ,  C04B35/571 ,  C08G77/02 ,  C08G77/48 ,  C08G77/60 ,  C04B35/00

    Abstract: A process for the preparation of preceramic metallopolysilanes is described. The process consists of contacting and reacting organohalogendisilanes with metal containing compounds in the presence of a redistribution catalyst in an inert, essentially anhydrous atmosphere while removing volatile byproducts. The resulting metallopolysilanes contain significant amounts of aluminum, boron, chromium, lanthanum, molybdenum, neodymium, niobium, samarium, tantalum, titanium,tungsten, vanadium, yttrium, or zirconium. Such metallopolysilanes can be prepared with relatively low oxygen levels. These polymers are useful as chemical intermediates to synthesize organosilicon materials or polymers. These polymers are also useful, when fired at high temperatures, to form ceramic materials.

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