公开(公告)号：US3924320A

公开(公告)日：1975-12-09

申请号：US51623674

申请日：1974-10-18

Applicant: IBM

Inventor： ALTMAN CARL ,  CHAPMAN SYDNEY G ,  SATYA AKELLA V S

IPC: H01L21/00 ,  H01L21/263 ,  H01L21/285 ,  H01L29/47 ,  H01L29/872 ,  B01J17/00

CPC classification number: H01L29/872 ,  H01L21/00 ,  H01L21/2633 ,  H01L21/28537 ,  H01L29/47 ,  Y10S438/906

Abstract: A method for improving the reverse leakage characteristics in metal semiconductor contact devices is disclosed. The process embodies ionic plasma bombardment as a step in producing improved reverse bias current voltage characteristics between metal semiconductor contacts.

Abstract translation: 公开了一种用于改善金属半导体接触装置中的反向泄漏特性的方法。 该方法体现离子等离子体轰击作为在金属半导体触点之间产生改进的反向偏置电流电压特性的步骤。

公开(公告)号：DE3274301D1

公开(公告)日：1987-01-02

申请号：DE3274301

申请日：1982-05-24

Applicant: IBM

Inventor： ALTMAN CARL ,  BASSOUS ERNEST ,  OSBURN CARLTON M ,  PLESHKO PETER ,  REISMAN ARNOLD ,  SKOLNIK MARVIN B

IPC: G02B26/10 ,  G02B17/00 ,  G02B26/08 ,  H01J9/20 ,  G02F1/01 ,  G09F9/37 ,  H01J29/12

Abstract: A mirror array light valve comprises a plurality of closely adjacent mirror elements (23) each supported by an individual one of a plurality of post members (19p) disposed in a regular array on a transparent substrate (10). The post members (19p) support the mirror elements (23) under corresponding corners thereof so that all the mirror elements are deflectable in the same direction thereby causing light reflected by the mirror elements to be directed to a single quadrant. The post members are preferably hollow straight- sided cylindrical silicon dioxide structures produced by a self-limiting etching process.

公开(公告)号：DE2303410A1

公开(公告)日：1973-10-31

申请号：DE2303410

申请日：1973-01-24

Applicant: IBM

Inventor： ALTMAN CARL ,  CHAPMAN SYDNEY GEORGE ,  SATYA A VENKATA SURYA

IPC: H01L29/872 ,  H01L21/00 ,  H01L21/263 ,  H01L21/285 ,  H01L29/00 ,  H01L29/47 ,  H01L9/00