公开(公告)号：EP1820061A4

公开(公告)日：2010-09-22

申请号：EP05825085

申请日：2005-11-03

Applicant: IBM

Inventor： HUANG WU-SONG ,  BURNS SEAN ,  VARANASI PUSHKARA RAO

IPC: G03F7/11 ,  G03F7/004 ,  G03F7/09

CPC classification number: G03F7/091 ,  G03F7/0046 ,  G03F7/0752 ,  G03F7/2041

公开(公告)号：EP2376982A4

公开(公告)日：2012-07-11

申请号：EP10729417

申请日：2010-01-05

Applicant: IBM

Inventor： BURNS SEAN ,  BRODSKY COLIN ,  BURNS RYAN

IPC: G03F7/00 ,  G03F7/027 ,  G03F7/09 ,  G03F7/16 ,  H01L21/02

CPC classification number: G03F7/027 ,  G03F7/094 ,  G03F7/168

公开(公告)号：EP1825325A4

公开(公告)日：2010-05-26

申请号：EP05857596

申请日：2005-11-30

Applicant: IBM

Inventor： HUANG WU-SONG ,  BURNS SEAN ,  KHOJASTEH MAHMOUD

IPC: G03F7/09 ,  G03C1/76

CPC classification number: G03F7/094 ,  G03F7/091

公开(公告)号：GB2489645A

公开(公告)日：2012-10-03

申请号：GB201213664

申请日：2010-10-22

Applicant: IBM

Inventor： BURNS SEAN ,  MEDEIROS DAVID ,  PFEIFFER DIRK

IPC: G03F7/00 ,  C08G77/00

Abstract: An antireflective hardmask composition layer including a polymer having Si-O and non- silicon inorganic units in its backbone. The polymer includes chromophore and transparent moieties and a crosslinking component. The antireflective hardmask composition layer is employed in a method of forming a patterned material on a substrate.