公开(公告)号：DE2939044A1

公开(公告)日：1981-04-09

申请号：DE2939044

申请日：1979-09-27

Applicant: IBM DEUTSCHLAND

Inventor： BOHLEN HARALD DIPL PHYS ,  GRESCHNER JOHANN DIPL PHYS DR ,  NEHMIZ PETER DIPL PHYS DR ,  KULCKE WERNER DIPL PHYS DR

IPC: H01J37/20 ,  H01J37/304 ,  H01L21/68 ,  H01L21/26

Abstract: The mutual alignment of mask and substrate patterns of a specific semiconductor structure are attained by use of a plurality of individual marks in a specific geometric position with respect to each other. By the arrangement of openings in the alignment pattern of the mask, the broad electron beam is split into a multitude of individual beams which interact with alignment marks on the substrate. The interaction is used to generate a coincidence signal. The signal to noise ratio of this arrangement is determined by the overall current and is comparable to that of a thin concentrated electron beam. Registration is effected in a small amount of time and the disadvantageous effects of the high current density used in the raster process are not a factor. In a preferred embodiment, the alignment pattern of the mask is a matrix with center spacings of openings increasing upon advance in two directions perpendicular to each other such that no distance can be represented by the sum of smaller distances. Alignment signals are provided by detecting either absorbed or reflected electrons. A plurality of detectors in the mask are used to detect the reflected electrons.

公开(公告)号：DE2837590A1

公开(公告)日：1980-03-13

申请号：DE2837590

申请日：1978-08-29

Applicant: IBM DEUTSCHLAND

Inventor： BOHLEN HARALD DIPL PHYS ,  ENGELKE HELMUT DIPL PHYS DR ,  GRESCHNER JOHANN DIPL PHYS DR ,  KULCKE WERNER DIPL PHYS DR ,  NEHMIZ PETER DIPL PHYS DR

IPC: H01L21/027 ,  H01J37/30 ,  H01J37/304 ,  H01L21/263 ,  H01L21/423

公开(公告)号：DE19603043C2

公开(公告)日：1997-11-27

申请号：DE19603043

申请日：1996-01-29

Applicant: IBM

Inventor： BARTHA JOHANN DIPL PHYS DR ,  DRUSCHKE FRANK DIPL CHEM DR ,  ELSNER GERHARD DIPL PHYS DR ,  GRESCHNER JOHANN DIPL PHYS DR

IPC: B41J2/415 ,  H01J3/04 ,  H01J27/26 ,  B41J2/41 ,  H01L21/306

公开(公告)号：DE19603043A1

公开(公告)日：1997-08-21

申请号：DE19603043

申请日：1996-01-29

Applicant: IBM

Inventor： BARTHA JOHANN DIPL PHYS DR ,  DRUSCHKE FRANK DIPL CHEM DR ,  ELSNER GERHARD DIPL PHYS DR ,  GRESCHNER JOHANN DIPL PHYS DR

IPC: B41J2/415 ,  H01J3/04 ,  H01J27/26 ,  B41J2/41 ,  H01L21/306

Abstract: The ion generator includes a dielectric plate (1) comprising a number of electrodes (3) on one surface (1a), and covered with a structured conductive layer (2). A number of dielectric spacers (4) have respective second electrodes (5) on the side facing away from the dielectric plate. The spacers are connected to the first surface (1a) of the dielectric plate in such a way that cavities are formed by the first electrodes, parts of the first surface of the dielectric plate, and by the spacers with the second electrodes. The cavities accommodate the generated plasma. The ion generator is formed in a micromechanical process. The dielectric plate and the dielectric spacers are formed in a modular fashion and connected by adhesive points (7) or bonding points (7).

公开(公告)号：DE19614072A1

公开(公告)日：1996-10-31

申请号：DE19614072

申请日：1996-04-09

Applicant: IBM

Inventor： BAYER THOMAS ,  GRESCHNER JOHANN DIPL PHYS DR ,  WEISS HELGA

IPC: G11B9/00 ,  G11B9/08 ,  G11C13/00

Abstract: A micromechanically manufactured read/write head (1) for charge coupled devices has a holder (2), a bearing arm (3) and a point (4) with a shaft (4a) and a front end (4b). The holder (2), the bearing arm (3) and the point form an integrated part (5) made of conductive material. The front end (4b) of the point (4) can directly contact the surface of a charge coupled device to read and write information. The shaft (4a) of the point (4) has a small diameter and is surrounded by a reinforcing sheath (6).

公开(公告)号：DE3719200A1

公开(公告)日：1988-12-29

申请号：DE3719200

申请日：1987-06-09

Applicant: IBM DEUTSCHLAND

Inventor： GRESCHNER JOHANN DIPL PHYS DR ,  SCHMID GERHARD DIPL PHYS DR ,  STEINER WERNER DIPL ING ,  TRIPPEL GERHARD DIPL PHYS DR

IPC: B29D17/00 ,  G11B7/24 ,  G11B7/253 ,  G11B7/26 ,  G11B21/06

Abstract: An optical storage disk consists of a glass substrate (1) into which guide tracks (3) for servo-controlling the focussed light beams are directly stamped by a hot stamp process. After stamping, the glass substrate is thermally quenched in the stamping device to increase its breaking resistance through thermal curing. In order to achieve uniform guide tracks over the entire surface of an optical storage disk, flexible stamp stencils (35) in a flexible holder (34) are used whose curvature can be changed by applying hydro-static pressure. Suitable stamp stencils consist of monocristalline silicon disks with surface hardening, or of metal disks, structured in photolithographic processes. The stamp lands are made with bevelled edges to facilitate the separating of stamp and glass substrate after cooling.

公开(公告)号：DE2922416A1

公开(公告)日：1980-12-11

申请号：DE2922416

申请日：1979-06-01

Applicant: IBM DEUTSCHLAND

Inventor： BOHLEN HARALD DIPL PHYS ,  ENGELKE HELMUT DIPL PHYS DR ,  GRESCHNER JOHANN DIPL PHYS DR ,  NEHMIZ PETER DIPL PHYS DR

IPC: H01L21/027 ,  G03F1/00 ,  G03F1/20 ,  H01L21/31 ,  H01L21/308

Abstract: A mask for structuring surface areas and a method for manufacture thereof. The mask includes at least one metal layer with throughgoing apertures which define the mask pattern and a semiconductor substrate for carrying the metal layer. The semiconductor substrate has throughholes that correspond to the mask pattern. The throughholes in the semiconductor substrate extend from the metal layer-covered surface on the front to at least one tubshaped recess which extends from the other back surface into the semiconductor substrate. Holes are provided in a surface layer in the semiconductor substrate. The surface layer differs in its doping from the rest of the substrate and the holes which are provided in the surface layer have lateral dimensions larger than the apertures in the metal layer so that the metal layer protrudes over the surface layer.

公开(公告)号：DE2739502A1

公开(公告)日：1979-03-08

申请号：DE2739502

申请日：1977-09-02

Applicant: IBM DEUTSCHLAND

Inventor： BOHLEN HARALD DIPL PHYS ,  GRESCHNER JOHANN DIPL PHYS DR ,  KULCKE WERNER DIPL PHYS DR ,  NEHMIZ PETER DIPL PHYS DR

IPC: H01L21/027 ,  G03F1/00 ,  G03F1/20 ,  G03F7/20 ,  H01J37/30 ,  H01L21/00 ,  H01L21/68

Abstract: A method of exposure of a target object by means of corpuscular beam shadow printing through a mask with several complementary zones wherein the beam, shiftable and tiltable about a point in the mask plane and arranged in parallel at a small distance from the target object, is first impinged upon a first of the complementary zones, then the object is shifted under a second of the complementary zones, and the positioning of the beam is changed so that any deviation of the actual position of the second area of the target object to be exposed from its nominal position is determined and compensated for by tilting the beam about a point substantially in the mask plane.