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    3.
    发明专利
    未知

    公开(公告)号：DE1589982A1

    公开(公告)日：1970-04-09

    申请号：DE1589982

    申请日：1967-12-01

    Applicant: IBM

    Inventor： RUSSELL BARBER ROBERT ,  HEINZ LOEFFLER KARL

    IPC: G11B7/09 ,  G11C13/04 ,  H01J29/52 ,  H01J29/82 ,  H01J37/04 ,  H01J37/09 ,  H01J37/21 ,  H01J37/244 ,  H01J37/304 ,  H01J29/46

    Abstract: 1,201,176. Automatic control for electron beam data recording systems. INTERNATIONAL BUSINESS MACHINES CORP. Nov.27, 1967 [Dec.21, 1966], No.53759/67. Heading G3R. The intensity of an electron beam striking the memory element 9 of a data recording system, is automatically maintained at a predetermined value by detecting the intensity at the element 9 to produce an electrical signal representative thereof, comparing this signal with a reference signal in a differential amplifier 39 and using the error signal to adjust the control current in the coil of an electromagnetic lens 15a, such adjustment altering the beam diameter at an aperture 28a to vary the number of electrons passing therethrough. As shown, a beam detector 37 is placed adjacent the element 9 and comprises a P/N junction having an impedance proportional to the intensity of the beam, which is made to intermittently strike the detector 37 as it scans across the element 9, by providing the latter with a series of opaque lines 41 perpendicular to the scanning direction and forming a series of adjacent and alternately positioned opaque and transparent portions. This produces an A.C. signal superimposed on a constant current through the detector and having a peak value proportional to the beam intensity, the combined signal being fed to a level detector 38 which produces a D.C. output signal representative of the peak value. After comparison of this output with a reference signal 46 representative of desired beam intensity, the error signal from amplifier 39 is fed to an analog storage device 48 which comprises a field effect transistor whose bias voltage is supplied by a large value capacitor charged by the error signal, so that a signal is stored until another is received from the amplifier 39. Thereafter, the signal controls the driver 49 of the coil of lens 15a to vary its magnification and hence the diameter of the beam. To prevent this change in magnification from affecting the overall functioning of the beam generating device 8, the signal from driver 49 is fed to the driver 55 of another lens 15 in such a manner that the magnification of the latter is changed in proportion but oppositely to the change in magnification of the lens 15a. The construction of the electron beam generator 8 is described, Figs.1 and 2 (not shown). Application of the invention to control a laser beam generator is envisaged.

    4.
    发明专利
    未知

    公开(公告)号：DE1807484A1

    公开(公告)日：1969-06-19

    申请号：DE1807484

    申请日：1968-11-07

    Applicant: IBM

    Inventor： HEINZ LOEFFLER KARL

    IPC: B04B5/00 ,  B04B11/00 ,  G11C13/04 ,  H01J37/147 ,  H01J29/70

    Abstract: 1,202,960. Electron beam apparatus. INTERNATIONAL BUSINESS MACHINES CORP. 28 Oct., 1968 [9 Nov., 1967], No. 51005/68. Heading H1D. In electron beam apparatus for displaying or recording binary digital information on a target 16, Fig. 1, sections of a flat sheet beam 11 produced by a gun 10 and an aperture plate 12a with the aid of a condenser lens 12 are blanked out by selective deflection at an array of deflection conductors 18 which are arranged in a line at an acute angle to the axis of the beam and which are individually connected to a data control device 20. The deflected sections of the beam are blanked at the aperture plate 14 in the vicinity of a focusing lens 15. The deflection conductors 18 are clamped in slots 36, Fig. 4, in the lower of a pair of plates 21, 22 bolted together at 24. The beam 11 passes through a passageway formed by elongated cavities 32, 34 and the narrow space between upper and lower lands 30, 31. The upper ends of the conductors 18 are flush with the surface of the lower land 31 and the conductors 18 are clamped in position by the pressure of flat springs 38, 39 on the conductor insulators 37. The conductors 18 may be shaped to extend a distance along the beam axis (Fig. 5). The target 16, Fig. 1, may be indexed upwards or downwards for the writing of adjacent lines of information or the coil 15 may deflect the beam over a field of several lines. The target may be the face of a C.R.T., a photoresist covered object or a silver halide photographic film.

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