公开(公告)号：DE69514171D1

公开(公告)日：2000-02-03

申请号：DE69514171

申请日：1995-07-13

Applicant: IBM

Inventor： FAHEY JAMES THOMAS ,  HERBST BRIAN WAYNE ,  LINEHAN LEO LAWRENCE ,  MOREAU WAYNE MARTIN ,  SPINILLO GARY THOMAS ,  WELSH KEVIN MICHAEL ,  WOOD ROBERT LAVIN

IPC: G03F7/004 ,  C08G65/40 ,  C08G67/00 ,  C09D171/00 ,  G03F7/09 ,  G03F7/11 ,  H01L21/027

Abstract: A co-polymer of benzophenone and bisphenol A has been shown to have DUV absorption properties. Therefore, the co-polymer has particular utility as an antireflective coating in microlithography applications. Incorporating anthracene into the co-polymer backbone enhances absorption at 248 nm. The endcapper used for the co-polymer can vary widely depending on the needs of the user and can be selected to promote adhesion, stability, and absorption of different wavelengths.

公开(公告)号：DE69514171T2

公开(公告)日：2000-06-21

申请号：DE69514171

申请日：1995-07-13

Applicant: IBM

Inventor： FAHEY JAMES THOMAS ,  HERBST BRIAN WAYNE ,  LINEHAN LEO LAWRENCE ,  MOREAU WAYNE MARTIN ,  SPINILLO GARY THOMAS ,  WELSH KEVIN MICHAEL ,  WOOD ROBERT LAVIN

IPC: G03F7/004 ,  C08G65/40 ,  C08G67/00 ,  C09D171/00 ,  G03F7/09 ,  G03F7/11 ,  H01L21/027

Abstract: A co-polymer of benzophenone and bisphenol A has been shown to have DUV absorption properties. Therefore, the co-polymer has particular utility as an antireflective coating in microlithography applications. Incorporating anthracene into the co-polymer backbone enhances absorption at 248 nm. The endcapper used for the co-polymer can vary widely depending on the needs of the user and can be selected to promote adhesion, stability, and absorption of different wavelengths.