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公开(公告)号:EP0698230A4
公开(公告)日:1995-10-24
申请号:EP94900495
申请日:1993-10-29
Applicant: IBM
Inventor: BRUNSVOLD WILLIAM ROSS , BREYTA GREGORY , DIPIETRO RICHARD ANTHONY , ITO HIROSHI , KNORS CHRISTOPHER JOHN , KWONG RANEE WAI-LING , MIURA STEVE SEIICHI , MONTGOMERY MELVIN WARREN , MOREAU WAYNE MARTIN , SACHDEV HARBANS SINGH , WELSH KEVIN MICHAEL
IPC: G03F7/004 , G03F7/039 , H01L21/027 , G03C5/16 , G03F7/029
CPC classification number: G03F7/039
Abstract: Resists for use in ultraviolet, electron beam and x-ray exposure devices comprising a polymeric or molecular composition the solubility of which is dependent upon the presence of acid removable protecting groups and a sulfonic acid precursor which generates a strong acid upon exposure to such radiation. The preferred sulfonic acid precursors are triflate esters or benzenesulfonyloxy esters of N-hydroxyimides.
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公开(公告)号:DE69125745D1
公开(公告)日:1997-05-28
申请号:DE69125745
申请日:1991-01-25
Applicant: IBM
Inventor: BRUNSVOLD WILLIAM ROSS , KNORS CHRISTOPHER JOHN , MONTGOMERY MELVIN WARREN , MOREAU WAYNE MARTIN , WELSH KEVIN MICHAEL
IPC: G03F7/004 , G03F7/029 , G03F7/039 , H01L21/027 , H01L21/30
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公开(公告)号:DE69514171T2
公开(公告)日:2000-06-21
申请号:DE69514171
申请日:1995-07-13
Applicant: IBM
Inventor: FAHEY JAMES THOMAS , HERBST BRIAN WAYNE , LINEHAN LEO LAWRENCE , MOREAU WAYNE MARTIN , SPINILLO GARY THOMAS , WELSH KEVIN MICHAEL , WOOD ROBERT LAVIN
IPC: G03F7/004 , C08G65/40 , C08G67/00 , C09D171/00 , G03F7/09 , G03F7/11 , H01L21/027
Abstract: A co-polymer of benzophenone and bisphenol A has been shown to have DUV absorption properties. Therefore, the co-polymer has particular utility as an antireflective coating in microlithography applications. Incorporating anthracene into the co-polymer backbone enhances absorption at 248 nm. The endcapper used for the co-polymer can vary widely depending on the needs of the user and can be selected to promote adhesion, stability, and absorption of different wavelengths.
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公开(公告)号:DE69514171D1
公开(公告)日:2000-02-03
申请号:DE69514171
申请日:1995-07-13
Applicant: IBM
Inventor: FAHEY JAMES THOMAS , HERBST BRIAN WAYNE , LINEHAN LEO LAWRENCE , MOREAU WAYNE MARTIN , SPINILLO GARY THOMAS , WELSH KEVIN MICHAEL , WOOD ROBERT LAVIN
IPC: G03F7/004 , C08G65/40 , C08G67/00 , C09D171/00 , G03F7/09 , G03F7/11 , H01L21/027
Abstract: A co-polymer of benzophenone and bisphenol A has been shown to have DUV absorption properties. Therefore, the co-polymer has particular utility as an antireflective coating in microlithography applications. Incorporating anthracene into the co-polymer backbone enhances absorption at 248 nm. The endcapper used for the co-polymer can vary widely depending on the needs of the user and can be selected to promote adhesion, stability, and absorption of different wavelengths.
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公开(公告)号:DE69125745T2
公开(公告)日:1997-11-13
申请号:DE69125745
申请日:1991-01-25
Applicant: IBM
Inventor: BRUNSVOLD WILLIAM ROSS , KNORS CHRISTOPHER JOHN , MONTGOMERY MELVIN WARREN , MOREAU WAYNE MARTIN , WELSH KEVIN MICHAEL
IPC: G03F7/004 , G03F7/029 , G03F7/039 , H01L21/027 , H01L21/30
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