公开(公告)号：DE69231175T2

公开(公告)日：2000-12-14

申请号：DE69231175

申请日：1992-10-23

Applicant: IBM

Inventor： SACHDEV HARBANS SINGH ,  CONLEY WILLARD EARL ,  JAGANNATHAN PREMLATHA ,  KATNANI AHMAD DAUOD ,  WAI-LING KWONG RANEE ,  LINEHAN LEO LAWRENCE ,  MIURA STEVE SEIICHI ,  SMITH RANDOLPH JOSEPH

IPC: G03F7/004 ,  G03F7/038 ,  G03F7/075 ,  H01L21/027 ,  H01L21/30

Abstract: High sensitivity, high contrast, heat-stable resist compositions for use in deep UV, i-line e-beam and x-ray lithography. These compositions comprise a film-forming polymer having aromatic rings activated for electrophilic substitution, an acid catalyzable crosslinking agent which forms a hydroxy-stabilized carbonium ion, and a photoacid generator. The compositions are aqueous base developable.

公开(公告)号：DE69231175D1

公开(公告)日：2000-07-20

申请号：DE69231175

申请日：1992-10-23

Applicant: IBM

Inventor： SACHDEV HARBANS SINGH ,  CONLEY WILLARD EARL ,  JAGANNATHAN PREMLATHA ,  KATNANI AHMAD DAUOD ,  WAI-LING KWONG RANEE ,  LINEHAN LEO LAWRENCE ,  MIURA STEVE SEIICHI ,  SMITH RANDOLPH JOSEPH

IPC: G03F7/004 ,  G03F7/038 ,  G03F7/075 ,  H01L21/027 ,  H01L21/30

Abstract: High sensitivity, high contrast, heat-stable resist compositions for use in deep UV, i-line e-beam and x-ray lithography. These compositions comprise a film-forming polymer having aromatic rings activated for electrophilic substitution, an acid catalyzable crosslinking agent which forms a hydroxy-stabilized carbonium ion, and a photoacid generator. The compositions are aqueous base developable.

公开(公告)号：DE69514171D1

公开(公告)日：2000-02-03

申请号：DE69514171

申请日：1995-07-13

Applicant: IBM

Inventor： FAHEY JAMES THOMAS ,  HERBST BRIAN WAYNE ,  LINEHAN LEO LAWRENCE ,  MOREAU WAYNE MARTIN ,  SPINILLO GARY THOMAS ,  WELSH KEVIN MICHAEL ,  WOOD ROBERT LAVIN

IPC: G03F7/004 ,  C08G65/40 ,  C08G67/00 ,  C09D171/00 ,  G03F7/09 ,  G03F7/11 ,  H01L21/027

Abstract: A co-polymer of benzophenone and bisphenol A has been shown to have DUV absorption properties. Therefore, the co-polymer has particular utility as an antireflective coating in microlithography applications. Incorporating anthracene into the co-polymer backbone enhances absorption at 248 nm. The endcapper used for the co-polymer can vary widely depending on the needs of the user and can be selected to promote adhesion, stability, and absorption of different wavelengths.

公开(公告)号：DE69230684T2

公开(公告)日：2000-08-17

申请号：DE69230684

申请日：1992-10-23

Applicant: IBM

Inventor： CLECAK NICHOLAS JEFFRIES ,  WILLSON CARLTON GRANT ,  MCDONALD SCOTT ARTHUR ,  CONLEY WILLARD EARL ,  KWONG RANEE WAI-LING ,  SCHLOSSER HUBERT ,  LINEHAN LEO LAWRENCE ,  SACHDEV HARBANS SINGH

IPC: G03F7/004 ,  G03F7/029 ,  G03F7/038 ,  G03F7/039 ,  G03F7/26 ,  G03F7/36 ,  G03F7/38 ,  H01L21/027 ,  H01L21/30

Abstract: Dry developable top surface imageable photoresist compositions which comprise, in admixture, a film-forming aromatic polymer resin activated to electrophilic substitution, an acid catalyzable agent capable of bing inserted into the aromatic polymer resin, and a radiation degradable acid generating compound and processes for generating positive tone resist images on substrates therewith.

公开(公告)号：DE69514171T2

公开(公告)日：2000-06-21

申请号：DE69514171

申请日：1995-07-13

Applicant: IBM

Inventor： FAHEY JAMES THOMAS ,  HERBST BRIAN WAYNE ,  LINEHAN LEO LAWRENCE ,  MOREAU WAYNE MARTIN ,  SPINILLO GARY THOMAS ,  WELSH KEVIN MICHAEL ,  WOOD ROBERT LAVIN

IPC: G03F7/004 ,  C08G65/40 ,  C08G67/00 ,  C09D171/00 ,  G03F7/09 ,  G03F7/11 ,  H01L21/027

Abstract: A co-polymer of benzophenone and bisphenol A has been shown to have DUV absorption properties. Therefore, the co-polymer has particular utility as an antireflective coating in microlithography applications. Incorporating anthracene into the co-polymer backbone enhances absorption at 248 nm. The endcapper used for the co-polymer can vary widely depending on the needs of the user and can be selected to promote adhesion, stability, and absorption of different wavelengths.

公开(公告)号：DE69230684D1

公开(公告)日：2000-03-23

申请号：DE69230684

申请日：1992-10-23

Applicant: IBM

Inventor： CLECAK NICHOLAS JEFFRIES ,  WILLSON CARLTON GRANT ,  MCDONALD SCOTT ARTHUR ,  CONLEY WILLARD EARL ,  KWONG RANEE WAI-LING ,  SCHLOSSER HUBERT ,  LINEHAN LEO LAWRENCE ,  SACHDEV HARBANS SINGH

IPC: G03F7/004 ,  G03F7/029 ,  G03F7/038 ,  G03F7/039 ,  G03F7/26 ,  G03F7/36 ,  G03F7/38 ,  H01L21/027 ,  H01L21/30

Abstract: Dry developable top surface imageable photoresist compositions which comprise, in admixture, a film-forming aromatic polymer resin activated to electrophilic substitution, an acid catalyzable agent capable of bing inserted into the aromatic polymer resin, and a radiation degradable acid generating compound and processes for generating positive tone resist images on substrates therewith.