公开(公告)号：JPH10182989A

公开(公告)日：1998-07-07

申请号：JP25249297

申请日：1997-09-17

Applicant: IBM

Inventor： BRUNSVOLD WILLIAM ROSS ,  FAHEY JAMES THOMAS ,  HEFFERON GEORGE JOSEPH ,  HUANG WU-SONG ,  JAGANNATHAN PREMLATHA ,  KATNANI AHMAD DAUOD ,  KHOJASTEH MAHMOUD ,  KWONG RANEE WAI-LING ,  KIM YAN LEE ,  SACHDEV HARBANS SINGH ,  SACHDEV KRISHNA GANDI ,  SOORIYAKUMARAN RATNAM ,  WOOD ROBERT LAVIN

IPC: C08L25/02 ,  C08L61/10 ,  C08L101/00 ,  G03F7/004 ,  G03F7/039 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To make a composition hardly receive a disadvantageous reaction with environmental contaminants, enhance the tolerance for variable or long delay between exposure and printing after the exposure or printing after the exposure and development, eliminate any deterioration in a profile, stabilize the solubility in solvents and impart storage life thereof in a solution for a long period at ambient temperature. SOLUTION: This microlithographic composition comprises a composition, containing a film-forming polymer substituted at the o-position with an acid unstable compound containing a ketal component in at least a part of a chemically bound recurring hydroxyl group and an acid-generating compound, capable of forming an acid by exposure to actinic radiations and chemically bound to the polymer and used as the microlithographic composition. The acid generated by the exposure initiates the cleavage of at least a part of the compound containing the ketal component and the exposed composition becomes selectively more soluble in an aqueous base as compared with an unexposed composition.

公开(公告)号：DE69514171D1

公开(公告)日：2000-02-03

申请号：DE69514171

申请日：1995-07-13

Applicant: IBM

Inventor： FAHEY JAMES THOMAS ,  HERBST BRIAN WAYNE ,  LINEHAN LEO LAWRENCE ,  MOREAU WAYNE MARTIN ,  SPINILLO GARY THOMAS ,  WELSH KEVIN MICHAEL ,  WOOD ROBERT LAVIN

IPC: G03F7/004 ,  C08G65/40 ,  C08G67/00 ,  C09D171/00 ,  G03F7/09 ,  G03F7/11 ,  H01L21/027

Abstract: A co-polymer of benzophenone and bisphenol A has been shown to have DUV absorption properties. Therefore, the co-polymer has particular utility as an antireflective coating in microlithography applications. Incorporating anthracene into the co-polymer backbone enhances absorption at 248 nm. The endcapper used for the co-polymer can vary widely depending on the needs of the user and can be selected to promote adhesion, stability, and absorption of different wavelengths.

公开(公告)号：DE69514171T2

公开(公告)日：2000-06-21

申请号：DE69514171

申请日：1995-07-13

Applicant: IBM

Inventor： FAHEY JAMES THOMAS ,  HERBST BRIAN WAYNE ,  LINEHAN LEO LAWRENCE ,  MOREAU WAYNE MARTIN ,  SPINILLO GARY THOMAS ,  WELSH KEVIN MICHAEL ,  WOOD ROBERT LAVIN

IPC: G03F7/004 ,  C08G65/40 ,  C08G67/00 ,  C09D171/00 ,  G03F7/09 ,  G03F7/11 ,  H01L21/027

Abstract: A co-polymer of benzophenone and bisphenol A has been shown to have DUV absorption properties. Therefore, the co-polymer has particular utility as an antireflective coating in microlithography applications. Incorporating anthracene into the co-polymer backbone enhances absorption at 248 nm. The endcapper used for the co-polymer can vary widely depending on the needs of the user and can be selected to promote adhesion, stability, and absorption of different wavelengths.