Abstract:
Thin-film microflex twisted-wire pair and other connectors are disclosed. Semiconductor packages include microflex technology that electrically connects at least one chip to another level of packaging. Microflex connectors, such as thin-film twisted-wire pair connectors according to the present invention provide superior electrical performance, which includes reduced line inductance, incorporation of integrated passive components, and attachment of discrete passive and active components to the microflex. All of these features enable operation of the chip at increased frequencies.
Abstract:
Through-chip conductors for low inductance chip-to-chip integration and off-chip connections in a semiconductor package is disclosed. A semiconductor device has active devices on the front surface, a first through-chip conductor having first electrical/physical characteristics passing from the front surface of the device to the back surface, a second through-chip conductor having second electrical/physical characteristics passing to the back surface, and an off-chip or chip-to-chip connector electrically connecting the active devices on the front surface to a different level of packaging.
Abstract:
PROBLEM TO BE SOLVED: To provide a technique of selectively removing a material, which is used at the time of forming an electronic module, constituted of a 'stack' of a plurality of chips, from a cut groove region (kerf region) related to the semiconductor chips. SOLUTION: This method includes a method of providing a wafer having a plurality of integrated circuit chips having a cut groove region 17 between them. Chip metallized films 15 and 16 exist in the region 17. The wafer is protected using a photolithographic process, and only the region 17 is exposed. Then, the wafer is etched, and the chip metallized films are removed from the region 17. Then the wafer is diced, and the chips are stacked to form a monolithic electronic module. The side surfaces of the module are treated to expose a transfer metallic film which extends to the side surfaces of the module. Thereby, the electrical connection of the transfer metallic film to the chips in the module is facilitated.
Abstract:
A cube package of stacked silicon semiconductor chips. To accommodate cube packaging, a metal transfer layer is added over the passivated chip face (16) to bring all of the surface electrical contacts to a common chip edge. The metal transfer layer (9) is insulated from the chip face and from the adjacent chip in the stack by polymer layers (16) having a low dielectric constant, and a thermal expansion coefficient matching that of the stacked chips. An adhesive polymer layer is added to strengthen the bond between the first polymer layers and the adjacent chip in the stack, by deposition of the adhesive layer and partial cure at the wafer level, and then full cure when the chips are stacked together to form the cube.
Abstract:
A cube package of stacked silicon semiconductor chips. To accommodate cube packaging, a metal transfer layer is added over the passivated chip face (16) to bring all of the surface electrical contacts to a common chip edge. The metal transfer layer (9) is insulated from the chip face and from the adjacent chip in the stack by polymer layers (16) having a low dielectric constant, and a thermal expansion coefficient matching that of the stacked chips. An adhesive polymer layer is added to strengthen the bond between the first polymer layers and the adjacent chip in the stack, by deposition of the adhesive layer and partial cure at the wafer level, and then full cure when the chips are stacked together to form the cube.
Abstract:
A cube package of stacked silicon semiconductor chips. To accommodate cube packaging, a metal transfer layer is added over the passivated chip face (16) to bring all of the surface electrical contacts to a common chip edge. The metal transfer layer (9) is insulated from the chip face and from the adjacent chip in the stack by polymer layers (16) having a low dielectric constant, and a thermal expansion coefficient matching that of the stacked chips. An adhesive polymer layer is added to strengthen the bond between the first polymer layers and the adjacent chip in the stack, by deposition of the adhesive layer and partial cure at the wafer level, and then full cure when the chips are stacked together to form the cube.
Abstract:
A cube package of stacked silicon semiconductor chips. To accommodate cube packaging, a metal transfer layer is added over the passivated chip face (16) to bring all of the surface electrical contacts to a common chip edge. The metal transfer layer (9) is insulated from the chip face and from the adjacent chip in the stack by polymer layers (16) having a low dielectric constant, and a thermal expansion coefficient matching that of the stacked chips. An adhesive polymer layer is added to strengthen the bond between the first polymer layers and the adjacent chip in the stack, by deposition of the adhesive layer and partial cure at the wafer level, and then full cure when the chips are stacked together to form the cube.
Abstract:
An integrated high-performance decoupling capacitor, formed on a semiconductor chip, using the substrate of the chip itself in conjunction with a metallic deposit formed on the presently unused chip back surface and electrically connected to the active chip circuit to result in a significant and very effective decoupling capacitor in close proximity to the active circuit on the chip requiring such decoupling capacitance. Specifically the present invention achieves this desirable result by providing a dielectric layer on the unused backside of the chip and forming a metal deposit on the formed backside dielectric layer and an electrical connection, between the metallic deposit and the active chip circuit via a through hole in the chip. Very precise decoupling of selected areas in the chip circuit can be achieved by forming precise and multiple metal deposits of either the same size or of varying sizes to define specific capacitances and individually connecting these deposits to the circuit areas needing the precise decoupling capacitance.