公开(公告)号：CA1250177A

公开(公告)日：1989-02-21

申请号：CA496973

申请日：1985-12-05

Applicant: IBM

Inventor： HULT ANDERS ,  ITO HIROSHI ,  MACDONALD SCOTT A ,  WILLSON C GRANT

IPC: H01L21/30 ,  G03F7/20 ,  G03F7/26 ,  G03F7/38 ,  H01L21/027 ,  H01L21/302 ,  H01L21/3065

Abstract: PROCESS FOR PREPARING NEGATIVE RELIEF IMAGES Negative relief images are generated by a process comprising the use of cationic polymerization and plasma etching.

公开(公告)号：DE3667553D1

公开(公告)日：1990-01-18

申请号：DE3667553

申请日：1986-01-24

Applicant: IBM

Inventor： HULT ANDERS ,  ITO HIROSHI ,  MACDONALD SCOTT ARTHUR ,  WILLSON CARLTON GRANT

IPC: H01L21/30 ,  G03F7/20 ,  G03F7/26 ,  G03F7/38 ,  H01L21/027 ,  H01L21/302 ,  H01L21/3065 ,  G03C1/68 ,  G03F7/10

Abstract: Negative relief images are generated by a process comprising the use of cationic polymerization and plasma etching. The process comprises a process for generating a negative tone resist image comprising the steps of:(1) coating a substrate with a film that contains a cationic photoinitiator;(2) exposing the film in an imagewise fashion to radiation and thereby generating cationic initiator in the exposed regions of the film;(3) treating the exposed film with a cationic-sensitive monomer to form a film of polymer resistant to plasma etching; and(4) developing the resist image by etching with a plasma.