Abstract:
Very small patterns may be etched in aluminum or other metal surfaces using photoresist to mask areas of the surfaces where etching is not desired by applying a Werner complex of chromium with a carboxylic acid to the metal surface. The process is particularly useful for etching conducting lines in microminiature semiconductor device fabrication because the chromium complex increases the adhesion of the photoresist to the aluminum sufficiently to improve line resolution in subsequent etching, and does not increase bridging between adjacent conducting lines.
Abstract:
In the etching through a protective glass coating to expose an underlying metal, overetching is prevented by adding a polyhydric alcohol, for example glycerin, to a glass etchant, which causes a color change on a metal, for example aluminum or molybdenum, indicating that etching through the glass coating has been completed.
Abstract:
VERY SMALL PATTERNS MAY BE ETCHED IN SILICON DIOXIDE OR OTHER OXIDE SURFACES USING PHOTORESIST TO MASK AREAS OF SURFACES WHERE ETCHING IS NOT DESRIED BY APPLYING A DISILYLAMIDE TO THE SURFACE TO INCREASE THE AHESION OF THE PHOTORESIST. THE PROCESS IS PARTICULARLY USEFUL FOR ETCHING PATTERNS IN SILICON DIOXIDE MASKS USED IN THE FABRICATION OF MICROMINIATURE SEMICONDUCTOR DEVICES.
Abstract:
PROBLEM TO BE SOLVED: To provide a method for reducing and eliminating the strain of a plastic package. SOLUTION: A semiconductor module includes a semiconductor chip, a lead frame having a lead finger, and a down set member being in a mounting medium for reducing the strain and giving a flat package by balancing thermal stress between the lead finger and the mounting medium. The down set member may be the bent part of the lead frame. The down set member may be another body such as a dummy semiconductor chip.
Abstract:
A semiconductor module includes a semiconductor chip, a lead frame having lead fingers, and a down set member within an encapsulant for reduce warpage and providing a more planar package by balancing thermal stress between the lead fingers and the encapsulant. The down set member can be a bent portion of the lead frame. It can also be a separate body, such as a dummy semiconductor chip.
Abstract:
A semiconductor module includes a semiconductor chip, a lead frame having le ad fingers, and a down set member within an encapsulant for reduce warpage and providing a more planar package by balancing thermal stress between the lead fingers and the encapsulant. The down set member can be a bent portion of the lead frame. It can also be a separate body, such as a dummy semiconductor chip.
Abstract:
Self Aligned Schottky Guard Ring A method of forming a self aligned guard ring surrounding a schottky barrier diode device without requiring an enlargement of the final schottky barrier device. The method involves creating an overhanging opening in a insulator layer overlying a semiconductor body to expose the schottky contact area on the surface of the semiconductor body, depositing a diffusion barrier material such as molybdenum in the opening, the deposit being of the same size as the smallest part of the overhanging opening so that a guard ring can be formed from a vapor by diffusion around the deposited barrier material.
Abstract:
A SEMICONDUCTOR MODULE INCLUDES A SEMICONDUCTOR CHIP, A LEAD FRAME HAVING LEAD FINGERS, AND A DOWN SET MEMBER WITHIN AN ENCAPSULANT FOR REDUCE WARPAGE AND PROVIDING A MORE PLANAR PACKAGE BY BALANCING THERMAL STRESS BETWEEN THE LEAD FINGERS AND THE ENCAPSULANT. THE DOWN SET MEMBER CAN BE A BENT PORTION OF THE LEAD FRAME. IT CAN ALSO BE A SEPARATE BODY, SUCH AS A DUMMY SEMICONDUCTOR CHIP.
Abstract:
A semiconductor module includes a semiconductor chip, a lead frame having lead fingers, and a down set member within an encapsulant for reduce warpage and providing a more planar package by balancing thermal stress between the lead fingers and the encapsulant. The down set member can be a bent portion of the lead frame. It can also be a separate body, such as a dummy semiconductor chip.