APPARATUS AND METHOD FOR SOLDERING TO FINE PITCH

    公开(公告)号:JPH0637442A

    公开(公告)日:1994-02-10

    申请号:JP10633793

    申请日:1993-05-07

    Applicant: IBM

    Abstract: PURPOSE: To realize soldering to a minute pitch land with no bridging generated by allowing a solder paste to be screened through a mask. CONSTITUTION: A resist 6 is processed so as to provide the same height as a copper land 4 on a substrate 2, so that a solder 30 is imprinted through a hole 22 of a mask 20 of an appropriate size, and with a platen 50 which absorbs the solder 30 and warps, a sufficient heat and pressure for re-flow of the solder 30 is applied. The hole 22 of the mask 20 is in mil units, so as to be at about a level obtained by multiplying the number of corresponding lands 4 by a pitch, and the heated platen 50 falls to contact to the solder 30 and remains there, until the solder 30 melts. Thus, the platen 50 such as not absorbing the solder 30 rises and a remaining flux and solder particles are removed. Thus, a specified amount of solder is accurately stuck to a minute pitch conducting line, for the realization of soldering to a minute pitch land.

    5.
    发明专利
    未知

    公开(公告)号:DE3883740T2

    公开(公告)日:1994-04-14

    申请号:DE3883740

    申请日:1988-12-12

    Applicant: IBM

    Abstract: An anodizing bath for aluminum alloys is disclosed; the aqueous bath solution contains sulfuric acid, citric acid, urea, and ammoniated colloidal silica; the latter three components being a complexing agent, a levelling agent and a stabilizing agent, respectively, so as to result in an oxide layer having and amorphous structure which eliminates necessity of scaling thick anodic coating.

    6.
    发明专利
    未知

    公开(公告)号:DE3883740D1

    公开(公告)日:1993-10-07

    申请号:DE3883740

    申请日:1988-12-12

    Applicant: IBM

    Abstract: An anodizing bath for aluminum alloys is disclosed; the aqueous bath solution contains sulfuric acid, citric acid, urea, and ammoniated colloidal silica; the latter three components being a complexing agent, a levelling agent and a stabilizing agent, respectively, so as to result in an oxide layer having and amorphous structure which eliminates necessity of scaling thick anodic coating.

    8.
    发明专利
    未知

    公开(公告)号:DE3763747D1

    公开(公告)日:1990-08-23

    申请号:DE3763747

    申请日:1987-03-24

    Applicant: IBM

    Abstract: An alloy for forming electrical contacts, comprises by weight Beryllium 1 - 2% Palladium 2 - 20%; and the balance being Nickel. The alloy may contain a trace amount (less than 0.01 per cent by weight) of titanium. An electrical contact may consist of a layer of gold deposited directly on a base of the beryllium/palladium/nickel alloy.

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